Results 181 to 190 of about 17,147,784 (231)

Atom–Cluster Synergy in Scalable Fe–Ru Dual‐Site Architectures Accelerates Alkaline Hydrogen Evolution

open access: yesAdvanced Materials, EarlyView.
A mechanochemically synthesized dual‐site electrocatalyst (RuNC@Fe1NC) accelerates alkaline hydrogen evolution via atomic‐level spatial decoupling. Oxophilic Fe single atoms effectively dissociate water, while adjacent Ru nanoclusters rapidly recombine hydrogen.
Jae‐Hoon Baek   +9 more
wiley   +1 more source

Selective Laser Sintering and Graphitization for Mono‐Matrix Unibody Fabrication of Integrated Stereo‐Circuit and Stereo‐Fluidic Wearable Electronics

open access: yesAdvanced Materials, EarlyView.
A novel selective laser sintering and graphitization (SLSG) 3D printing technology enables unibody fabrication of compacted insulating structures and conductive circuits in fluidic‐integrated wearable electronics through adaptive photonic modulation.
Li Zhang, Wing Cheung Mak
wiley   +1 more source

Inverse Design of Nanoparticulate Materials

open access: yesAdvanced Materials, EarlyView.
Inverse design shifts nanomaterial development from empirical trial‐and‐error to predictive model‐driven strategies. It can rely on knowledge‐based, data‐based, or hybrid process and property functions. This perspective article provides a practical framework for applying inverse design based on instructive examples. It discusses which modeling approach
Nabi Etienne Traoré   +5 more
wiley   +1 more source

Molybdenum Disulfide Bilayers Hybridized With Reduced Graphene Oxide Nanosheets for Enhanced Hydrogen Evolution Reaction

open access: yesAdvanced Materials Interfaces, EarlyView.
The integration of reduced graphene oxide nanosheet‐hybridized molybdenum disulfide bilayers to enhance hydrogen evolution reaction capabilities unveils thrilling opportunities for strain engineering, defect manipulation, and sophisticated twist‐angle assemblies with 2D heterostructures.
Bruno Ferreira Brischi   +8 more
wiley   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

open access: yesAdvanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source

Trends in demographic and health survey publications based on a bibliometric analysis. [PDF]

open access: yesGlob Health Action
Omondi E   +8 more
europepmc   +1 more source

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