Results 201 to 210 of about 7,713 (265)

Enhanced Performance of an Au/MoS₂/GaAs Photodetector by Room-Temperature Metal Electrode Transfer. [PDF]

Nanomaterials (Basel)
Li C, Jiang W, Qiu C, Xu J.
europepmc   +1 more source

Liquid‐Processed 2D Aromatic Amorphous Carbon: Defect Engineering and Universal Transport Scaling

Small, EarlyView.
Liquid‐processed graphene oxide (GO) thin films undergo a controllable crystalline–to–amorphous transition driven by thermal quenching. By kinetically tuning oxygen‐driven defect formation during reduction, scalable 2D aromatic amorphous carbon phases are stabilized, directly linking nanoscale disorder and defect topology to electronic transport ...
Fabiola Liscio, Andrea Fondacaro, Gaetana Petrone, Federico Chianese, Jasper Rikkert Plaisier, Sara Fiori, Orlando Castellano, Alice Apponi, Nicolò Galvani, Verónica Montes García, Veronica Valentini, Stefano Iacobucci, Damiano Ricciarelli, Giuseppe Fisicaro, Antonino Lamagna, Giovanni Maria Vinai, Ernesto Placidi, Alessandro Bellucci, Daniele Maria Trucchi, Paolo Samorì, Alessandro Ruocco, Samuel Lara Avila, Andrea Liscio   +22 more
wiley   +1 more source

Advanced Characterization of 2D Materials Using SLEEM/ToF. [PDF]

Nanomaterials (Basel)
Pizúrová V, Piňos J, Průcha L, Konvalina I, Beranová K, Romanyuk O, Bertolla L, Müllerová I, Materna Mikmeková E.   +8 more
europepmc   +1 more source

Broadband and Enhanced Second‐Harmonic Generation in Metallic 3R‐TaS2

Small, EarlyView.
A pronounced and robust SHG response has been observed in metallic 3R‐TaS2. It shows broadband SH conversion from 1020 nm to 1410 nm. Moreover, compared to the sapphire substrate, 3R‐TaS2 flakes with various thicknesses on the gold substrate showed different SHG enhancement; the enhancement factors range from 2.7 to 45.5.
Ruo‐Si Chen, Chuanyu Wang, Xiangqi Liu, Zhuoyuan Lu, Shuyao Qiu, Boqing Liu, Tieyu Lü, Shi‐Rui Zhang, Yanfeng Guo, Yuerui Lu   +9 more
wiley   +1 more source

Impact of Sapphire Substrate Reconstruction on the Structural, Electronic, and Photonic Properties of MoS₂. [PDF]

Small
Torsi R, Munson KT, Eppler D, Laura J, Turker F, Feidler MA, Appenzeller J, Lin YC, Robinson JA.   +8 more
europepmc   +1 more source

Material‐Dependent Functionalization of CVD‐Grown TMDC Monolayers Probed by Vibrational Nanospectroscopy

Small, EarlyView.
PiFM‐led investigation of material‐specific electrochemical aryl diazonium reduction on 2D transition metal dichalcogenide MoSe2‐WSe2 lateral heterostructure monolayers, with mechanisms explained by molecular dynamics simulations. ABSTRACT Understanding the molecular‐level mechanisms governing covalent functionalization of two‐dimensional ...
Maziar Jafari, Amir Khojastehnezhad, Seyed Faridedin Rafie, Andrey Krayev, Nidal Abu‐Zahra, Mohamed Siaj   +5 more
wiley   +1 more source

Progress in Strain Engineering of 2D-Integrated Heterostructures for Ultrasensitive Sensors. [PDF]

Adv Sci (Weinh)
Ton TB, Tran TS, Tran DK, Dau VT, Dao DV.   +4 more
europepmc   +1 more source

Phase Engineering of Plasma‐Enhanced Atomic Layer Deposited Molybdenum Disulfide Using High Accuracy Direct Writing With Focused Li+ and Ga+ Ion Beams and Ultrashort Pulse Laser

Small, EarlyView.
In the context of phase heterostructures on two‐dimensional materials, a high‐precision direct writing approach is employed. This involves using a focused ion beam to transform molybdenum disulfide to the metallic 1T phase, followed by retransformation via ultrashort pulse laser processing.
Marvin Krüner, Achim Nadzeyka, Malte Jonas Marius Julian Becher, Zhongquan Liao, Detlef Rogalla, André Clausner, Andreas Ostendorf, Michael Kahl, Claudia Bock   +8 more
wiley   +1 more source

Wafer-scale formation of MoS₂ with controlled thickness and high uniformity via conversion of MoO_x using H₂S sulfurization and subsequent crystallization. [PDF]

Sci Rep
Okada N, Tanabe S, Miura H, Cheng H, Huang Y, Warashina H, Fukazawa A, Maehara H, Irisawa T.   +8 more
europepmc   +1 more source

Preventing Plasma‐Induced Resist Hardening in Molybdenum Disulfide Transistors via Sacrificial Metal Mask Lithography

Small, EarlyView.
Photoresist (PR) residue significantly degrades the electrical performance of 2D semiconductors such as MoS2. In particular, the intrinsically ultrathin nature of these materials makes them highly susceptible to damage during conventional PR cleaning procedures.
Dahyeon Kim, Yanfeng Zhao, Sungyeon Kim, Seungchan Lee, Sangmin Eom, Tae Yeon Kim, Hyun Seok Lee, Joonki Suh, Byungjo Kim, Myungsoo Kim   +9 more
wiley   +1 more source