Results 301 to 310 of about 4,029,680 (315)

Zinc Chalcogenide Based Shell Layers for Colloidal Quantum Wells

open access: yesAdvanced Materials Interfaces, EarlyView.
A new synthetic route is developed for the synthesis of CdSe/ZnSe/ZnS multi‐shell nanoplatelets (NPLs) with emissions between 615 and 630 nm and photoluminescence quantum yields up to 90%. Control over the lateral size of the starting CdSe core enabled the narrowing of the emission linewidth to 20 nm.
Cagatay Han Aldemir   +5 more
wiley   +1 more source

Mechanistic Insights into the Surface Instabilities of TiNb2O7, a High‐Power Li‐Ion Anode

open access: yesAdvanced Materials Interfaces, EarlyView.
TiNb2O7 is an attractive anode for Li‐ion batteries, particularly when safety is of the highest concern. However, despite operating at high potentials, electrolyte degradation is a major concern. It is demonstrated that throughout the entire charge‐discharge cycle a number of surface reactions occur which both produce gas and result in Ti dissolution ...
Stephanie Bazylevych   +7 more
wiley   +1 more source

Theoretical and Experimental Investigation of the Ligand‐Directed Assembly and Photovoltaic Performance of PbSe Nanorods

open access: yesAdvanced Materials Interfaces, EarlyView.
This study delves into the critical role of ligand type on morphology, photophysical behavior, and optoelectronic performance of PbSe Nanorods (NRs). A combination of computational modelling and experimental techniques reveals that EDT‐capped PbSe NRs exhibit well‐ordered packing with strong interfacial coupling and improved optoelectronic performance.
İrem Kolay   +4 more
wiley   +1 more source

Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance

open access: yesAdvanced Materials Interfaces, EarlyView.
Porphyrin derivatives are introduced for electron beams and extreme ultraviolet lithography. The lithographic performance of the novel CuTP‐4Epoxy photoresist is excellent, with a resolution of 18 nm in EBL and 20 nm in EUVL, and the photoresist also exhibits high etch resistance.
Yurui Wu   +14 more
wiley   +1 more source

A Microfluidic Multiplex Sorter for Strain Development

open access: yesAdvanced Materials Technologies, Volume 10, Issue 6, March 18, 2025.
A new multiplex method for high‐throughput screening of yeast strains based on glucoamylase production is presented. Droplets containing single mutant yeast cells are incubated for enzyme production. A sorting platform divides mutants by their high‐ and mid‐activity levels.
Chiara Leal‐Alves   +6 more
wiley   +1 more source

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