Results 141 to 150 of about 2,766 (177)

Textured anti-reflection and down-conversion composite functional films for high-efficiency solar cells. [PDF]

open access: yesRSC Adv
Jin S   +11 more
europepmc   +1 more source

Reflection grating fabrication for the Rockets for Extended-source X-ray Spectroscopy. [PDF]

open access: yesExp Astron (Dordr)
Miles DM   +6 more
europepmc   +1 more source
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Nanoimprint lithography

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1996
Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated further. Nanoimprint lithography has demonstrated 25 nm feature size, 70 nm pitch, vertical and smooth sidewalls, and nearly 90° corners. Further experimental study indicates that the ultimate
Stephen Y. Chou   +2 more
openaire   +1 more source

Nanoimprinted Polymer Solar Cell

ACS Nano, 2012
Among the various organic photovoltaic devices, the conjugated polymer/fullerene approach has drawn the most research interest. The performance of these types of solar cells is greatly determined by the nanoscale morphology of the two components (donor/acceptor) and the molecular orientation/crystallinity in the photoactive layer.
Yi, Yang   +4 more
openaire   +2 more sources

Nanoimprinted Immunosensors

2019
In this chapter, we focus on introducing a combination of plasmonic biosensors and nanoimprint technology. Initially, we describe the basics of nanoimprint and plasmonics based biosensing methods, localised surface plasmon resonance (LSPR) and surface enhanced Raman scattering (SERS); then, we present a review regarding the current situation of ...
Shu Jiang, Masato Saito
openaire   +1 more source

Scanning probe nanoimprint lithography

Nanotechnology, 2010
The present paper reports on a novel lithographic approach at the nanoscale level, which is based on scanning probe microscopy (SPM) and nanoimprint lithography (NIL). The experimental set-up consists of an atomic force microscope (AFM) operated via software specifically developed for the purpose.
Dinelli F   +4 more
openaire   +4 more sources

Electrochemical Nanoimprint Lithography

2021 IEEE 16th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS), 2021
Electrochemical Nanoimprint Lithography (ECNL) works directly on semiconductor wafer, free of thermoplastic and photocuring resists, and without any auxiliary process. The principle of ECNL is the spatially confined electrochemical corrosion caused by the contact potential across the metal/semiconductor phase boundaries exposed to electrolyte solution.
Hantao Xu   +7 more
openaire   +1 more source

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