Results 151 to 160 of about 2,766 (177)

Functional Nanoimprinting

Chemical Vapor Deposition, 2012
AbstractA cure‐activated nanolayer transfer technique is described, which when combined with soft imprinting (lithography) can be used to fabricate multiple surface‐functionalized replicas from the same mould without the need for a separate secondary functionalization step.
Hayley G. Andrews, Thomas J. Wood, Wayne C. E. Schofield, Jas Pal S. Badyal   +3 more
openaire   +1 more source

Advances in Nanoimprint Lithography

Annual Review of Chemical and Biomolecular Engineering, 2016
Nanoimprint lithography (NIL), a molding process, can replicate features <10 nm over large areas with long-range order. We describe the early development and fundamental principles underlying the two most commonly used types of NIL, thermal and UV, and contrast them with conventional photolithography methods used in the semiconductor industry.
Matthew C, Traub, Whitney, Longsine, Van N, Truskett   +2 more
openaire   +2 more sources

Nanoimprint lithography: an alternative nanofabrication approach

Materials Science and Engineering: C, 2003
A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical
Sotomayor Torres, C.M., Zankovych, S., Seekamp, J., Kam, A.P., Cedeño, C. Clavijo, Hoffmann, T., Ahopelto, Jouni, Reuther, F., Pfeiffer, K., Bleidiessel, G., Gruetzner, G., Maximov, M.V., Heidari, B.   +12 more
openaire   +2 more sources

Advances in Nanoimprint Lithography

2007 7th IEEE Conference on Nanotechnology (IEEE NANO), 2007
Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography.
Lugli, P, Harrer, S, Strobel, S, BRUNETTI, FRANCESCA, Scarpa, G, Tornow, M, Abstreiter, G.   +6 more
openaire   +1 more source

Electrochemical nanoimprint lithography: when nanoimprint lithography meets metal assisted chemical etching

Nanoscale, 2017
The functional three dimensional micro-nanostructures (3D-MNS) play crucial roles in integrated and miniaturized systems because of the excellent physical, mechanical, electric and optical properties. Nanoimprint lithography (NIL) has been versatile in the fabrication of 3D-MNS by pressing thermoplastic and photocuring resists into the imprint mold ...
Jie Zhang, Lin Zhang, Lianhuan Han, Zhao-Wu Tian, Zhong-Qun Tian, Dongping Zhan   +5 more
openaire   +2 more sources

Four-inch photocurable nanoimprint lithography using NX-2000 nanoimprinter

SPIE Proceedings, 2004
Photo-curable nanoimprint lithography (P-NIL), a low pressure and room temperature process, is developed on Nanonex NX-2000 nanoimprintor. The process is capable of achieving uniform imprinting over large area in less than 60 seconds, which is mainly attributed to the Nanonex patented air cushion press (ACP) technology.
Mingtao Li, Hua Tan, Linshu Kong, Larry Koecher   +3 more
openaire   +1 more source

SEMATECH's nanoImprint program: a key enabler for nanoimprint introduction

SPIE Proceedings, 2009
SEMATECH has initiated a nanoimprint program and started imaging experiments with a Molecular Imprints Imprio300TM system at the SEMATECH facility in Albany, NY. An overview of the SEMATECH nanoimprint development program is presented as well as an assessment of nanoimprint technology strengths and weaknesses.
Lloyd C. Litt, Matt Malloy
openaire   +1 more source

Bilayer, nanoimprint lithography

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2000
Nanoimprint lithography has been shown to be a viable means of patterning polymer films in the sub-100 nm range. In this work, we demonstrate the use of a bilayer resist to facilitate the metal liftoff step in imprinter fabrication. The bilayer resist technology exhibits more uniform patterns and fewer missing features than similar metal nanoparticle ...
Faircloth, B, Rohrs, H, Tiberio, R, Ruoff, R, Krchnavek, RR   +4 more
openaire   +2 more sources

Nanoimprint Biosensors

2015
This book starts with an overview and introduction on the trends in nanofabrication and nanoimprint technology, followed by a detailed discussion on the design, fabrication, and evaluation of nanoimprint biosensors. The proto-model systems and some application examples of this sensor are also included in the chapters.
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Nanoimprint combination techniques

Microelectronic Engineering, 2015
Display Omitted 'Residual layer free imprint' by use of exposure on reflecting substrates.'Residual layer lithography' by use of interference effects to define patterns of about 50nm.'Hybrid lithography' to overcome pattern size limitations of T-NIL and UV-L.'3D multilevel patterns' by use of diffraction effects.
Khalid Dhima, Christian Steinberg, Si Wang, Marc Papenheim, Hella-Christin Scheer   +4 more
openaire   +1 more source