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Multilevel nanoimprint lithography
Current Applied Physics, 2004 Abstract Multilevel and three-dimensional (3D) patterning eliminates more complicated steps in the fabrication processes of micro and nanoscale structures. Multiple lithography processes with inter-level alignment or single lithography with multi layer resist is essential for three-dimensional patterning.M.M. Alkaisi, W. Jayatissa, M. Konijnopenaire +1 more sourceRoller nanoimprint lithography
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1998 An alternative approach to flat nanoimprint lithography (NIL)—roller nanoimprint lithography (RNIL) is demonstrated. Compared with flat NIL, RNIL has the advantage of better uniformity, less force, and the ability to repeat a mask continuously on a large substrate.Hua Tan, Andrew Gilbertson, Stephen Y. Chou +2 moreopenaire +1 more sourceNanoimprint Lithography
2012 Minami Yoda, Jean-Luc Garden, Olivier Bourgeois, Aeraj Haque, Aloke Kumar, Hans Deyhle, Simone Hieber, Bert Müller, Mary Cano-Sarabia, Daniel Maspoch, Konstantin Sobolev, Florence Sanchez, Esmaiel Jabbari, J. Tanner Nevill, Daniele Malleo, Peter Bøggild, Wei Chen, Chunlei Wang, Bharat Bhushan, Manuel L. B. Palacio, Shrikant C. Nagpure, Bharat Bhushan, Mónica Lira-Cantú, Irene González-Valls, Bharat Bhushan, Rustom B. Bhiladvala, Nastassja A. Lewinski, Matthew Wright, Paola Martino, Paolo Allia, Alessandro Chiolerio, Jason P. Gleghorn, Celeste M. Nelson, Emiliano Descrovi, Mirko Ballarini, Francesca Frascella, Daniel Neuhauser, Christopher Arntsen, Kenneth A. Lopata, Lixin Dong, Xinyong Tao, Zheng Fan, Li Zhang, Xiaobin Zhang, Bradley J. Nelson, Soichiro Tsuda, Sylvain Martel, Didi Xu, Li Zhang, Lixin Dong, Bradley J. Nelson, Timothy J. Merkel, Joseph M. DeSimone, Lucio Colombi Ciacchi, Susan Köppen, Michael Nosonovsky, Dongchan Jang, Jason Li, Steve To, Lidan You, Yu Sun, Lorenzo Lunelli, Cristina Potrich, Laura Pasquardini, Cecilia Pederzolli, Mariangela Lombardi, Menghan Zhou, Jian He, Luca Boarino, Giampiero Amato, Ille C. Gebeshuber, David W. Lee, Stefano Bianco, Angelica Chiodoni, Claudio Gerbaldi, Marzia Quaglio, Andrea Toma, Remo Proietti Zaccaria, Roman Krahne, Alessandro Alabastri, Maria Laura Coluccio, Gobind Das, Carlo Liberale, Francesco Angelis, Marco Francardi, Federico Mecarini, Francesco Gentile, Angelo Accardo, Liberato Manna, Enzo Fabrizio, Paola Rivolo, Bharat Bhushan, Kuo-Sheng Ma, Lu Dai, Yongfen Qi, Lixin Jia, Wei Yu, Jie Du, Bharat Bhushan, Satish C. Chaparala, Vikram Bhatia, Nipun Sinha, Matteo Rinaldi, V. Sai Muthukumar, Ramakrishna Podila, Benoy Anand, S. Siva Sankara Sai, K. Venkataramaniah, Reji Philip, Apparao M. Rao +109 moreopenaire +2 more sourcesNanoimprinting
2012 Minami Yoda, Jean-Luc Garden, Olivier Bourgeois, Aeraj Haque, Aloke Kumar, Hans Deyhle, Simone Hieber, Bert Müller, Mary Cano-Sarabia, Daniel Maspoch, Konstantin Sobolev, Florence Sanchez, Esmaiel Jabbari, J. Tanner Nevill, Daniele Malleo, Peter Bøggild, Wei Chen, Chunlei Wang, Bharat Bhushan, Manuel L. B. Palacio, Shrikant C. Nagpure, Bharat Bhushan, Mónica Lira-Cantú, Irene González-Valls, Bharat Bhushan, Rustom B. Bhiladvala, Nastassja A. Lewinski, Matthew Wright, Paola Martino, Paolo Allia, Alessandro Chiolerio, Jason P. Gleghorn, Celeste M. Nelson, Emiliano Descrovi, Mirko Ballarini, Francesca Frascella, Daniel Neuhauser, Christopher Arntsen, Kenneth A. Lopata, Lixin Dong, Xinyong Tao, Zheng Fan, Li Zhang, Xiaobin Zhang, Bradley J. Nelson, Soichiro Tsuda, Sylvain Martel, Didi Xu, Li Zhang, Lixin Dong, Bradley J. Nelson, Timothy J. Merkel, Joseph M. DeSimone, Lucio Colombi Ciacchi, Susan Köppen, Michael Nosonovsky, Dongchan Jang, Jason Li, Steve To, Lidan You, Yu Sun, Lorenzo Lunelli, Cristina Potrich, Laura Pasquardini, Cecilia Pederzolli, Mariangela Lombardi, Menghan Zhou, Jian He, Luca Boarino, Giampiero Amato, Ille C. Gebeshuber, David W. Lee, Stefano Bianco, Angelica Chiodoni, Claudio Gerbaldi, Marzia Quaglio, Andrea Toma, Remo Proietti Zaccaria, Roman Krahne, Alessandro Alabastri, Maria Laura Coluccio, Gobind Das, Carlo Liberale, Francesco Angelis, Marco Francardi, Federico Mecarini, Francesco Gentile, Angelo Accardo, Liberato Manna, Enzo Fabrizio, Paola Rivolo, Bharat Bhushan, Kuo-Sheng Ma, Lu Dai, Yongfen Qi, Lixin Jia, Wei Yu, Jie Du, Bharat Bhushan, Satish C. Chaparala, Vikram Bhatia, Nipun Sinha, Matteo Rinaldi, V. Sai Muthukumar, Ramakrishna Podila, Benoy Anand, S. Siva Sankara Sai, K. Venkataramaniah, Reji Philip, Apparao M. Rao +109 moreopenaire +1 more sourceNanoimprint Lithography Resists
2012 Resist is a mixture of a polymer or its precursor and other small molecules that the solubility or viscosity is changed by UV light or electron beam or ion beam or X-ray and used in the fabrication of IC field. Resists used during photolithography are called photoresists.openaire +1 more sourceNanoimprint Lithography Process
2012 It is well known now that a nanoimprint lithography process generally consists of stamp modification, spin coating of resist, imprinting, and then etching for pattern transfer. The stamp modification has been already demonstrated in Chap. 4. Before imprinting, the substrate surface is coated by a thin film for imprinting; how to create a uniform ...openaire +1 more source
