Results 161 to 170 of about 11,900 (214)
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1996
Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated further. Nanoimprint lithography has demonstrated 25 nm feature size, 70 nm pitch, vertical and smooth sidewalls, and nearly 90° corners. Further experimental study indicates that the ultimate
Stephen Y. Chou +2 more
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Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated further. Nanoimprint lithography has demonstrated 25 nm feature size, 70 nm pitch, vertical and smooth sidewalls, and nearly 90° corners. Further experimental study indicates that the ultimate
Stephen Y. Chou +2 more
openaire +1 more source
Scanning probe nanoimprint lithography
Nanotechnology, 2010The present paper reports on a novel lithographic approach at the nanoscale level, which is based on scanning probe microscopy (SPM) and nanoimprint lithography (NIL). The experimental set-up consists of an atomic force microscope (AFM) operated via software specifically developed for the purpose.
Dinelli F +4 more
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Advances in Nanoimprint Lithography
Annual Review of Chemical and Biomolecular Engineering, 2016Nanoimprint lithography (NIL), a molding process, can replicate features <10 nm over large areas with long-range order. We describe the early development and fundamental principles underlying the two most commonly used types of NIL, thermal and UV, and contrast them with conventional photolithography methods used in the semiconductor industry.
Matthew C, Traub +2 more
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Advances in Nanoimprint Lithography
2007 7th IEEE Conference on Nanotechnology (IEEE NANO), 2007Challenges and issues of Nanoimprint Lithography (NIL) are addressed and discussed. In particular, imprinting properties of an innovative epoxy-based polymer have been investigated, which can be used for combined thermal and ultraviolet nanoimprinting (TUV-NIL) processes aiming at high-throughput nanoimprint lithography.
Lugli, P +6 more
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Nanoimprint lithography: an alternative nanofabrication approach
Materials Science and Engineering: C, 2003A status report of nanoimprint lithography is given in the context of alternative nanofabrication methods. Since the ultimate resolution of nanoimprint appears to be determined by the stamp, this is discussed in detail, particularly the recent developments on polymer stamps. The scope of the technique is illustrated with applications in passive optical
Sotomayor Torres, C.M. +12 more
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Nanoscale, 2017
The functional three dimensional micro-nanostructures (3D-MNS) play crucial roles in integrated and miniaturized systems because of the excellent physical, mechanical, electric and optical properties. Nanoimprint lithography (NIL) has been versatile in the fabrication of 3D-MNS by pressing thermoplastic and photocuring resists into the imprint mold ...
Jie Zhang +5 more
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The functional three dimensional micro-nanostructures (3D-MNS) play crucial roles in integrated and miniaturized systems because of the excellent physical, mechanical, electric and optical properties. Nanoimprint lithography (NIL) has been versatile in the fabrication of 3D-MNS by pressing thermoplastic and photocuring resists into the imprint mold ...
Jie Zhang +5 more
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Bilayer, nanoimprint lithography
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2000Nanoimprint lithography has been shown to be a viable means of patterning polymer films in the sub-100 nm range. In this work, we demonstrate the use of a bilayer resist to facilitate the metal liftoff step in imprinter fabrication. The bilayer resist technology exhibits more uniform patterns and fewer missing features than similar metal nanoparticle ...
Faircloth, B +4 more
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Multilevel nanoimprint lithography
Current Applied Physics, 2004Abstract Multilevel and three-dimensional (3D) patterning eliminates more complicated steps in the fabrication processes of micro and nanoscale structures. Multiple lithography processes with inter-level alignment or single lithography with multi layer resist is essential for three-dimensional patterning.
M.M. Alkaisi, W. Jayatissa, M. Konijn
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SPIE Proceedings, 2005
We developed a UV assisted soft nanoimprint lithography (UV-SNIL) that can be applied for the reproduction of nanometer features over large areas. Based on a simple argument deduced from the Navier-Stokes equation, we suggest several solutions to enhance the imprinting process ability.
Y. Chen +4 more
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We developed a UV assisted soft nanoimprint lithography (UV-SNIL) that can be applied for the reproduction of nanometer features over large areas. Based on a simple argument deduced from the Navier-Stokes equation, we suggest several solutions to enhance the imprinting process ability.
Y. Chen +4 more
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Roller nanoimprint lithography
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1998An alternative approach to flat nanoimprint lithography (NIL)—roller nanoimprint lithography (RNIL) is demonstrated. Compared with flat NIL, RNIL has the advantage of better uniformity, less force, and the ability to repeat a mask continuously on a large substrate.
Hua Tan +2 more
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