Results 181 to 190 of about 11,900 (214)

Electrostatic Force-Assisted Nanoimprint Lithography (EFAN)

Nano Letters, 2005
We present and demonstrate a novel imprint method, electrostatic force-assisted nanoimprint lithography (EFAN), where a voltage applied between a mold and a substrate generates an electrostatic force that presses the mold into a resist on the substrate.
Liang, Xiaogan, Zhang, Wei, Li, Mingtao, Xia, Qiangfei, Wu, Wei, Ge, Haixiong, Huang, Xinyu, Chou, Stephen   +7 more
openaire   +3 more sources

Double transfer UV-curing nanoimprint lithography

Nanotechnology, 2013
A challenge in the fabrication of nanostructures into non-planar substrates is to form a thin, uniform resist film on non-planar surfaces. This is critical to the fabrication of nanostructures via a lithographic technique due to the subsequent pattern transfer process. Here we report a new double transfer UV-curing nanoimprint technique that can create
Yuan, CS, Ge, HX, Chen, YF, Li, W, Wu, W, Shen, YM, Yao, L, Li, ZW, Kou, JL, Cui, YS, Bian, J   +10 more
openaire   +4 more sources

Wafer Scale Nanoimprint Lithography

2003
Nanoimprint lithography (NIL) got large attention when it was introduced 1, 2 since it de-scribed the possibility for a low cost parallel nanotechnology. It got even larger attention when it was reported that sub 10 nm features on a Si stamp could be replicated into a resist layer, which in turn had a profile allowing a lift-off process to be possible ...
Lars Montelius, Babak Heidari
openaire   +1 more source

Superhydrophobic surfaces fabricated by nanoimprint lithography

Microelectronic Engineering, 2006
Superhydrophobic surfaces were fabricated on silicon by nanoimprint lithography and wet chemical etching. Glass molds were used to imprint a positive photoresist layer. The residual layer in imprinted regions was removed by UV-ozone exposure and subsequent developing of the photoresist.
Pozzato A.(1), Dal Zilio S. (1), Fois G. (1), Vendramin D.(1), Mistura G.(1), Belotti M.(2), Yong Chen (2), (3), Natali M.(4)   +8 more
openaire   +3 more sources

Nanoimprint Lithography Resists

2012
Resist is a mixture of a polymer or its precursor and other small molecules that the solubility or viscosity is changed by UV light or electron beam or ion beam or X-ray and used in the fabrication of IC field. Resists used during photolithography are called photoresists.
openaire   +1 more source

Nanoimprint Lithography Process

2012
It is well known now that a nanoimprint lithography process generally consists of stamp modification, spin coating of resist, imprinting, and then etching for pattern transfer. The stamp modification has been already demonstrated in Chap. 4. Before imprinting, the substrate surface is coated by a thin film for imprinting; how to create a uniform ...
openaire   +1 more source

Nanoimprint Lithography

2012
Minami Yoda, Jean-Luc Garden, Olivier Bourgeois, Aeraj Haque, Aloke Kumar, Hans Deyhle, Simone Hieber, Bert Müller, Mary Cano-Sarabia, Daniel Maspoch, Konstantin Sobolev, Florence Sanchez, Esmaiel Jabbari, J. Tanner Nevill, Daniele Malleo, Peter Bøggild, Wei Chen, Chunlei Wang, Bharat Bhushan, Manuel L. B. Palacio, Shrikant C. Nagpure, Bharat Bhushan, Mónica Lira-Cantú, Irene González-Valls, Bharat Bhushan, Rustom B. Bhiladvala, Nastassja A. Lewinski, Matthew Wright, Paola Martino, Paolo Allia, Alessandro Chiolerio, Jason P. Gleghorn, Celeste M. Nelson, Emiliano Descrovi, Mirko Ballarini, Francesca Frascella, Daniel Neuhauser, Christopher Arntsen, Kenneth A. Lopata, Lixin Dong, Xinyong Tao, Zheng Fan, Li Zhang, Xiaobin Zhang, Bradley J. Nelson, Soichiro Tsuda, Sylvain Martel, Didi Xu, Li Zhang, Lixin Dong, Bradley J. Nelson, Timothy J. Merkel, Joseph M. DeSimone, Lucio Colombi Ciacchi, Susan Köppen, Michael Nosonovsky, Dongchan Jang, Jason Li, Steve To, Lidan You, Yu Sun, Lorenzo Lunelli, Cristina Potrich, Laura Pasquardini, Cecilia Pederzolli, Mariangela Lombardi, Menghan Zhou, Jian He, Luca Boarino, Giampiero Amato, Ille C. Gebeshuber, David W. Lee, Stefano Bianco, Angelica Chiodoni, Claudio Gerbaldi, Marzia Quaglio, Andrea Toma, Remo Proietti Zaccaria, Roman Krahne, Alessandro Alabastri, Maria Laura Coluccio, Gobind Das, Carlo Liberale, Francesco Angelis, Marco Francardi, Federico Mecarini, Francesco Gentile, Angelo Accardo, Liberato Manna, Enzo Fabrizio, Paola Rivolo, Bharat Bhushan, Kuo-Sheng Ma, Lu Dai, Yongfen Qi, Lixin Jia, Wei Yu, Jie Du, Bharat Bhushan, Satish C. Chaparala, Vikram Bhatia, Nipun Sinha, Matteo Rinaldi, V. Sai Muthukumar, Ramakrishna Podila, Benoy Anand, S. Siva Sankara Sai, K. Venkataramaniah, Reji Philip, Apparao M. Rao   +109 more
openaire   +2 more sources

Nanoimprint Lithography

2007
Helmut Schift, Anders Kristensen
openaire   +1 more source

Lithography-free reconfigurable integrated photonic processor

Nature Photonics, 2023
Tianwei Wu, Zihe Gao, Liang Feng
exaly  

Nanoimprint Lithography

Extended Abstracts of the 1998 International Conference on Solid State Devices and Materials, 1998
openaire   +1 more source