Results 131 to 140 of about 2,601 (165)
Some of the next articles are maybe not open access.
Nanolithography of metal catalysts by Dip Pen Nanolithography
SPIE Proceedings, 2007Nano-patterning of metals on gold film and silicon nitride membrane using Dip Pen Nanolithography (DPN TM ) is reported in this study. Using this technique, nano-particles can be delivered or nano-scale features of metals can be deposited precisely at specific locations using the unique registration capabilities of DPN.
David Huitink +2 more
openaire +2 more sources
Journal of the American Chemical Society, 2005
We introduce Electro Pen Nanolithography (EPN), a nanoscale chemical patterning technique. In a single sweep of an ink-coated, biased conducting Atomic Force Microscope (AFM) probe-tip, an underlying thin organic film is oxidized, and the ink molecules are transferred directly to the oxidized regions.
Yuguang Cai, Benjamin M. Ocko
openaire +3 more sources
We introduce Electro Pen Nanolithography (EPN), a nanoscale chemical patterning technique. In a single sweep of an ink-coated, biased conducting Atomic Force Microscope (AFM) probe-tip, an underlying thin organic film is oxidized, and the ink molecules are transferred directly to the oxidized regions.
Yuguang Cai, Benjamin M. Ocko
openaire +3 more sources
Nanolithography of biointerfaces
Faraday Discussions, 2019This article is based on the Concluding remarks made at the Faraday Discussion meeting on Nanolithography of Biointerfaces, held in London, UK, 3–5thJuly 2019.
openaire +2 more sources
MRS Bulletin, 1996
It is yet unclear what type of new devices, if any, will replace the metaloxide field effect transistor in the sub 0.1-μm domain. Since in any case, the development of quantum-effect devices requires smaller and smaller dimensions for operation above temperatures of a few milliKelvin, we can safely assume that high-resolution patterning steps will ...
C. Marrian, F. Cerrina
openaire +2 more sources
It is yet unclear what type of new devices, if any, will replace the metaloxide field effect transistor in the sub 0.1-μm domain. Since in any case, the development of quantum-effect devices requires smaller and smaller dimensions for operation above temperatures of a few milliKelvin, we can safely assume that high-resolution patterning steps will ...
C. Marrian, F. Cerrina
openaire +2 more sources
NANOLITHOGRAPHY WITH FULLERITE AS A RESIST [PDF]
Physics, Chemistry and Application of Nanostructures, 2005 Electron-beam nanolithography with fullerite films was developed using different substrates. Fabrication of the ordered patterns with feature size in the range of tens of nanometres was demonstrated.
Nizhny Novgorod +3 more
openaire +1 more source
Chemical Nanolithography with Electron Beams
Advanced Materials, 2001A highly focused electron beam as the agent for spatially selective reductionof nitro groups to amino groups in a self‐assembled monolayer of aromatics is the key feature of a novel technique in chemical nanolithography presented here. Treatment of the reactive amino groups with different reactants after each e‐beam writing step yields a surface with a
Gölzhäuser, Armin +6 more
openaire +4 more sources
Shortwave projection nanolithography [PDF]
Herald of the Russian Academy of Sciences, 2008 The article below is dedicated to research into nanolithography in the ultrashort spectral region that was conducted at the RAS Institute for Physics of Microstructures and discussed at an RAS Presidium meeting. These findings, according to the participants in the meeting, can actually be used to revive the Russian microelectronic industry.
N. N. Salashchenko, N. I. Chkhalo
openaire +1 more source
Applications of dip-pen nanolithography
Nature Nanotechnology, 2007The ability to tailor the chemical composition and structure of a surface at the sub-100-nm length scale is important for studying topics ranging from molecular electronics to materials assembly, and for investigating biological recognition at the single biomolecule level.
Chad A. Mirkin +2 more
openaire +3 more sources
IEEE Nanotechnology Magazine, 2011
"We need to develop a nanolithography-based mastering process that can be transferred to commercial mass production. By the way, it must be low cost so we shall use a visible light instead of an electron beam (e-beam) or extreme ultraviolet (EUV) as an exposure light source, and hence we might need to circumvent some laws of physics along the way ...
Rung-Ywan Tsai +2 more
openaire +2 more sources
"We need to develop a nanolithography-based mastering process that can be transferred to commercial mass production. By the way, it must be low cost so we shall use a visible light instead of an electron beam (e-beam) or extreme ultraviolet (EUV) as an exposure light source, and hence we might need to circumvent some laws of physics along the way ...
Rung-Ywan Tsai +2 more
openaire +2 more sources
AFM Tip Hammering Nanolithography
Small, 2009AbstractNanolithography at low cost and high speed is made possible by using a vibrating AFM tip in tapping‐mode as a nanohammer to forge polystyrene‐block‐poly(ethylene/butylenes)‐block‐polystyrene triblock copolymer monolayer thin films after annealing to transform their microstructures from as‐cast poorly ordered cylinders into well‐ordered ...
Xiaodong Hong +5 more
openaire +3 more sources