Results 131 to 140 of about 2,392 (161)
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Science, 1999
A direct-write “dip-pen” nanolithography (DPN) has been developed to deliver collections of molecules in a positive printing mode. An atomic force microscope (AFM) tip is used to write alkanethiols with 30-nanometer linewidth resolution on a gold thin film in a manner analogous to that of a dip pen.
, Piner, , Zhu, , Xu, , Hong, , Mirkin
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A direct-write “dip-pen” nanolithography (DPN) has been developed to deliver collections of molecules in a positive printing mode. An atomic force microscope (AFM) tip is used to write alkanethiols with 30-nanometer linewidth resolution on a gold thin film in a manner analogous to that of a dip pen.
, Piner, , Zhu, , Xu, , Hong, , Mirkin
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Journal of the American Chemical Society, 2005
We introduce Electro Pen Nanolithography (EPN), a nanoscale chemical patterning technique. In a single sweep of an ink-coated, biased conducting Atomic Force Microscope (AFM) probe-tip, an underlying thin organic film is oxidized, and the ink molecules are transferred directly to the oxidized regions.
Yuguang, Cai, Benjamin M, Ocko
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We introduce Electro Pen Nanolithography (EPN), a nanoscale chemical patterning technique. In a single sweep of an ink-coated, biased conducting Atomic Force Microscope (AFM) probe-tip, an underlying thin organic film is oxidized, and the ink molecules are transferred directly to the oxidized regions.
Yuguang, Cai, Benjamin M, Ocko
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Proceedings, annual meeting, Electron Microscopy Society of America, 1983
In both science and technology there arises the need to fabricate structures on a scale < 100 nm. For example, the possibility for patterning material at the sub 100 nm scale may be useful for producing quasi two dimensional crystals (eg. 1), while the ability to construct fine metal wires ≈ 10 nm in lateral dimension is of interest in studying ...
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In both science and technology there arises the need to fabricate structures on a scale < 100 nm. For example, the possibility for patterning material at the sub 100 nm scale may be useful for producing quasi two dimensional crystals (eg. 1), while the ability to construct fine metal wires ≈ 10 nm in lateral dimension is of interest in studying ...
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Nanolithography of biointerfaces
Faraday Discussions, 2019This article is based on the Concluding remarks made at the Faraday Discussion meeting on Nanolithography of Biointerfaces, held in London, UK, 3–5thJuly 2019.
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AFM Tip Hammering Nanolithography
Small, 2009AbstractNanolithography at low cost and high speed is made possible by using a vibrating AFM tip in tapping‐mode as a nanohammer to forge polystyrene‐block‐poly(ethylene/butylenes)‐block‐polystyrene triblock copolymer monolayer thin films after annealing to transform their microstructures from as‐cast poorly ordered cylinders into well‐ordered ...
You, Wang +5 more
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Microphysics of Surfaces: Beam-Induced Processes, 1991
Our ability of fashion patterns with features below 100nm is beginning to be put to good use for the microfabrication of devices and even circuits. Achieving economic throughput along with the precision required for sub 100-nm features is an enormous challenge.
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Our ability of fashion patterns with features below 100nm is beginning to be put to good use for the microfabrication of devices and even circuits. Achieving economic throughput along with the precision required for sub 100-nm features is an enormous challenge.
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Surface Plasmon Interference Nanolithography
Nano Letters, 2005A new nanophotolithography technique based on the interference of surface plasmon waves is proposed and demonstrated by using computer simulations. The wavelengths of the surface plasmon waves at metal and dielectric interfaces can reach the nanometer scale while their frequencies remain in the optical range. As a result, the resolution of this surface
Zhao-Wei, Liu, Qi-Huo, Wei, Xiang, Zhang
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Nanolithography of metal catalysts by Dip Pen Nanolithography
SPIE Proceedings, 2007Nano-patterning of metals on gold film and silicon nitride membrane using Dip Pen Nanolithography (DPN TM ) is reported in this study. Using this technique, nano-particles can be delivered or nano-scale features of metals can be deposited precisely at specific locations using the unique registration capabilities of DPN.
David Huitink +2 more
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Block copolymer micelle nanolithography
Nanotechnology, 2003Au-nanoclusters between 2 and 8 nm in diameter were deposited onto solid substrates in different pattern geometries. The basis of this approach is the self-assembly of polystyrene-b-poly[2-vinylpyridine (HAuCl4)] diblock copolymer micelles into uniform monomicellar films on solid supports such as Si-wafers or glass cover slips.
Glass, R., Möller, M., Spatz, J.
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Low-pressure detachment nanolithography
Nanotechnology, 2006A simple, one-step method is developed to fabricate various nanostructures such as nanoholes and nanolines based on the detachment of an organic polymer film in contact with a patterned polyurethane acrylate mould under a low physical pressure (1-2 bar) at ambient conditions.
J K, Kim +5 more
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