Results 141 to 150 of about 2,601 (165)

Resist Materials and Nanolithography [PDF]

MRS Proceedings, 1999
AbstractThe work focuses on lithographic processes and materials for sub-50 nm lithography. Lithographic results of polymethyl methacrylates of molecular weights of 50,000, 100,000, 496,000, and 950, 000 are compared. It was found that the molecular weight and developer concentration do not affect smallest linewidth, within experimental error. However,
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Self-Aligned Nanolithography in a Nanogap

Nano Letters, 2009
A self-aligned nanolithography approach is reported to form a nanoscale via hole in a nanogap. Field emission between two opposite electrodes of a nanogap is used to expose the polymer resist within the nanogap region. A via hole pattern forms in the nanogap area after the exposure process.
Yung-Chen Lin, Jingwei Bai, Yu Huang
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Photosensitive metamaterial for nanolithography

2014 International Conference on Optical MEMS and Nanophotonics, 2014
This work presents the novel photosensitive metamaterial (metaphotoresist) with silver (Ag) and dielectric multilayer for ultraviolet nanolithography overcoming a diffraction limit. The metamaterial consists of multilayer with Ag and photoresist (PR) layers.
Sang-Gil Park, Sang Chul Jeon, Ki-Hun Jeong, Youngseop Lee   +3 more
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Nanoapertures without Nanolithography

ACS Photonics, 2018
We propose and experimentally demonstrate the implementation of lithography-free nanoapertures on optical fibers.
Alessandro Tuniz, Alessandro Tuniz, Henrik Schneidewind, Markus A. Schmidt, Stefan Weidlich, Jan Dellith   +5 more
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Electron Beam Nanolithography

1986
Lithography plays a central role in the fabrication of electronic devices, and is essential in the preparation of samples for studies of transport in 1-D. The minimum feature size required in the device is important in the choice of lithographic method.
S. P. Beaumont, C. D. W. Wilkinson
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SPM nanolithography of hydroxy-silicates

Nanotechnology, 2012
Bio-nanopatterning of surfaces is becoming a crucial technique with applications ranging from molecular and cell biology to medicine. Scanning probe microscopy (SPM) is one of the most useful tools for nanopatterning of flat surfaces. However, these patterns are usually built on homogeneous surfaces and require chemical functionalization to ensure ...
VALDRE', GIOVANNI, MORO, DANIELE, Hounsome C. M., Antognozzi M.   +3 more
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Nanolithography in microelectronics: A review

Technical Physics, 2011
The current status of basic photolithographic techniques allowing researchers to achieve results that seemed to be unrealistic even a short time ago is reviewed. For example, advanced DUV photolithography makes it possible to exactly reproduce IC elements 25 times smaller in size than the wavelength of an excimer laser used as a lithographic tool ...
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Structural Consequences of Ferroelectric Nanolithography

Nano Letters, 2011
Domains of remnant polarization can be written into ferroelectrics with nanoscale precision using scanning probe nanolithography techniques such as piezoresponse force microscopy (PFM). Understanding the structural effects accompanying this process has been challenging due to the lack of appropriate structural characterization tools.
Martin V. Holt, J. Maser, Ryan T. Smith, Sergei V. Kalinin, Nina Balke, Chang-Beom Eom, Seung Hyub Baek, Rebecca J. Sichel, Ji Young Jo, Pice Chen, Paul G. Evans, Kenneth Evans-Lutterodt   +11 more
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Surface Plasmon Interference Nanolithography

Nano Letters, 2005
A new nanophotolithography technique based on the interference of surface plasmon waves is proposed and demonstrated by using computer simulations. The wavelengths of the surface plasmon waves at metal and dielectric interfaces can reach the nanometer scale while their frequencies remain in the optical range. As a result, the resolution of this surface
Xiang Zhang, Zhaowei Liu, Qi-Huo Wei
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Nanotechnologies and nanolithography in Europe

SPIE Proceedings, 2002
European microelectronics industry recovered a strong position within last years, thanks in part to large cooperative programs involving both national and European funding. But, keeping in-line with Moore's law, entering the nano-era requires an increasingly effort in research and development.
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