Results 11 to 20 of about 4,510 (216)
Advanced Materials Interfaces, EarlyView., 2023 This review discusses the use of Surface‐Enhanced Raman Spectroscopy (SERS) combined with Artificial Intelligence (AI) for detecting antimicrobial resistance (AMR). Various SERS studies used with AI techniques, including machine learning and deep learning, are analyzed for their advantages and limitations.
Zakarya Al‐Shaebi +4 more
wiley +1 more source
Parallelization of thermochemical nanolithography [PDF]
Nanoscale, 2014 This work demonstrates parallelization of thermochemical nanolithography (TCNL) with sub-50 nm resolutions over areas of 500 μm for applications in conjugated polymers and graphene.
Suenne Kim +12 more
openaire +3 more sources
AIP Advances, 2021 We present a calibrated spectrum in the 5.5–265.5 nm range from a microdroplet-tin Nd:YAG-laser-produced plasma under conditions relevant for the production of extreme ultraviolet (EUV) light at 13.5 nm for nanolithography.
Z. Bouza +11 more
doaj +1 more source
Plasmonic enhancement of photoacoustic strain-waves on gold gratings
AIP Advances, 2022 In this paper, we report on the time-dependent strain-wave-induced changes in the reflection and diffraction of a gold plasmonic grating. We demonstrate efficient excitation of strain waves using enhanced absorption at and around the surface plasmon ...
G. de Haan +3 more
doaj +1 more source
Swept-source multimode fiber imaging
Scientific Reports, 2023 High-resolution compressive imaging via a flexible multimode fiber is demonstrated using a swept-laser source and wavelength dependent speckle illumination.
Benjamin Lochocki +4 more
doaj +1 more source
Nature Communications, 2020 Extreme ultraviolet (EUV) light is entering use in nanolithography. Here the authors discuss experimental and theoretical results about the prominent role of multiply-excited states in highly charged tin ions in the mechanism of EUV light emission from ...
F. Torretti +11 more
doaj +1 more source
Nanolithography: Status and challenges [PDF]
2017 23rd International Conference on Automation and Computing (ICAC), 2017 With the help of immersion lithography and multiple patterning, photolithography has been the key technology over the last decade in manufacturing of ICs, microchips and MEMS devices. Continuous rapid shrinking of feature size made the authorities to seek alternative patterning methods that can go beyond classic photographic limits.
Hasan, Rashed Md. Murad, Luo, Xichun
openaire +2 more sources
Multimode fiber ruler for detecting nanometric displacements
APL Photonics, 2022 Light is a perfect tool for numerous metrology applications. To deliver light to hard-to-reach places, fiber probes are widely used. Hair-thin endoscopes based on multimode fibers offer exceptional performance in terms of information density and ...
Ksenia Abrashitova, Lyubov V. Amitonova
doaj +1 more source
Spatial coherence control and analysis via micromirror-based mixed-state ptychography
New Journal of Physics, 2021 Flexible and fast control of the phase and amplitude of coherent light, enabled by digital micromirror devices (DMDs) and spatial light modulators, has been a driving force for recent advances in optical tweezers, nonlinear microscopy, and wavefront ...
Ruslan Röhrich +3 more
doaj +1 more source
Journal of Research of the National Institute of Standards and
Technology, 2016 This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab ...
Marcelo Davanco +33 more
openaire +5 more sources