Results 11 to 20 of about 2,601 (165)

Nanofabrications of T shape gates for high electron mobility transistors in microwaves and THz waves, a review

Micro and Nano Engineering, 2021
High electron mobility transistors (HEMTs) are the basic building block in microwave monolithic integration circuits (MMICs) for broad applications in micrometer (0.3–100 GHz), millimeter (100–300 GHz) and tera [1] hertz (300 GHz–10 THz) wave.
Mingsai Zhu, Yuying Xie, Jinhai Shao, Yifang Chen   +3 more
doaj   +1 more source

Plasmonic enhancement of photoacoustic strain-waves on gold gratings

AIP Advances, 2022
In this paper, we report on the time-dependent strain-wave-induced changes in the reflection and diffraction of a gold plasmonic grating. We demonstrate efficient excitation of strain waves using enhanced absorption at and around the surface plasmon ...
G. de Haan, E. Abram, T. J. van den Hooven, P. C. M. Planken   +3 more
doaj   +1 more source

Nanolithography: Status and challenges [PDF]

2017 23rd International Conference on Automation and Computing (ICAC), 2017
With the help of immersion lithography and multiple patterning, photolithography has been the key technology over the last decade in manufacturing of ICs, microchips and MEMS devices. Continuous rapid shrinking of feature size made the authorities to seek alternative patterning methods that can go beyond classic photographic limits.
Hasan, Rashed Md. Murad, Luo, Xichun
openaire   +2 more sources

Boosting solid-state high-harmonic generation efficiency by non-collinear XUV wave mixing with two-color drivers [PDF]

EPJ Web of Conferences
We present studies on boosting high-harmonic generation (HHG) efficiency from solids in the extreme-ultraviolet (XUV) region by two-color non-collinear wave mixing in silica.
Kuzkova Nataliia, Roscam Abbing Sylvianne D. C., van der Linden Roy, Campi Filippo, de Keijzer Brian, Morice Corentin, Zhang Zhuang-Yan, van der Geest Maarten L. S., Kraus Peter M.   +8 more
doaj   +1 more source

The Nanolithography Toolbox

Journal of Research of the National Institute of Standards and Technology, 2016
This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab ...
Marcelo Davanco, Daron A. Westly, B. Robert Ilic, Krishna C. Balram, Vladimir A. Aksyuk, Liya Yu, Pavel Neuzil, Pavel Neuzil, Vojtech Svatos, J. Alexander Liddle, Yuxiang Liu, Leonidas E. Ocola, Samuel M. Stavis, Christopher B. Wallin, Christopher B. Wallin, Richard Kasica, Gregory Simelgor, Nicolae Lobontiu, David A. Czaplewski, Meredith Metzler, Neal A. Bertrand, Slava Krylov, Ian Gilbert, Ian Gilbert, Juraj Topolancik, Kartik Srinivasan, Gerald G. Lopez, Christopher H. Ray, Qing Li, Qing Li, Karen E. Grutter, Kristen A. Dill, Thomas Michels, Brian A. Bryce   +33 more
openaire   +5 more sources

Material-resolved and thickness-sensitive lensless imaging using high-harmonic generation: From diffractive shear interferometry to ptychography [PDF]

EPJ Web of Conferences
Microscopy with table-top high-harmonic generation (HHG) sources enable high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range.
Zhang Fengling, Liu Xiaomeng, Pelekanidis Antonios, Gouder Matthias, Eikema Kjeld, Witte Stefan   +5 more
doaj   +1 more source

Advanced optical nanolithography by enhanced transmission through bull’s eye nanostructured meta-mask

Nanophotonics, 2023
Plasmonic optical nanolithography using extraordinary optical transmission through a metallic nanohole mask has been actively applied to the high-resolution fabrication of nanostructures over a large area.
Kim Taeyeon, Ahn Heesang, Kim Soojung, Song Hyerin, Choi Jong-ryul, Kim Kyujung   +5 more
doaj   +1 more source

Event-based reconstructions in Computational Microscopy [PDF]

EPJ Web of Conferences
We present a maximum-likelihood estimation (MLE) framework tailored to event-driven detectors to perform computational image reconstruction and phase retrieval.
Rivera Sanchez Fabrizio Aaron, Seifert Jacob, Karpavicius Augustas, Gouder Matthias, Witte Stefan   +4 more
doaj   +1 more source

Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography

Nature Communications, 2020
Extreme ultraviolet (EUV) light is entering use in nanolithography. Here the authors discuss experimental and theoretical results about the prominent role of multiply-excited states in highly charged tin ions in the mechanism of EUV light emission from ...
F. Torretti, J. Sheil, R. Schupp, M. M. Basko, M. Bayraktar, R. A. Meijer, S. Witte, W. Ubachs, R. Hoekstra, O. O. Versolato, A. J. Neukirch, J. Colgan   +11 more
doaj   +1 more source

The Evolution of Dip‐Pen Nanolithography [PDF]

Angewandte Chemie International Edition, 2003
AbstractThe ability to tailor the chemical composition and structure of a surface on the 1–100 nm length scale is important to researchers studying topics ranging from electronic conduction, to catalysis, to biological recognition in nanoscale systems.
Ginger, David S., Mirkin, Chad A., Zhang, Hua   +2 more
openaire   +6 more sources