Results 191 to 200 of about 4,510 (216)
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IEEE Nanotechnology Magazine, 2011
"We need to develop a nanolithography-based mastering process that can be transferred to commercial mass production. By the way, it must be low cost so we shall use a visible light instead of an electron beam (e-beam) or extreme ultraviolet (EUV) as an exposure light source, and hence we might need to circumvent some laws of physics along the way ...
Rung-Ywan Tsai +2 more
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"We need to develop a nanolithography-based mastering process that can be transferred to commercial mass production. By the way, it must be low cost so we shall use a visible light instead of an electron beam (e-beam) or extreme ultraviolet (EUV) as an exposure light source, and hence we might need to circumvent some laws of physics along the way ...
Rung-Ywan Tsai +2 more
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Resist Materials and Nanolithography [PDF]
MRS Proceedings, 1999 AbstractThe work focuses on lithographic processes and materials for sub-50 nm lithography. Lithographic results of polymethyl methacrylates of molecular weights of 50,000, 100,000, 496,000, and 950, 000 are compared. It was found that the molecular weight and developer concentration do not affect smallest linewidth, within experimental error. However,
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Self-Aligned Nanolithography in a Nanogap
Nano Letters, 2009A self-aligned nanolithography approach is reported to form a nanoscale via hole in a nanogap. Field emission between two opposite electrodes of a nanogap is used to expose the polymer resist within the nanogap region. A via hole pattern forms in the nanogap area after the exposure process.
Yung-Chen Lin, Jingwei Bai, Yu Huang
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Photosensitive metamaterial for nanolithography
2014 International Conference on Optical MEMS and Nanophotonics, 2014This work presents the novel photosensitive metamaterial (metaphotoresist) with silver (Ag) and dielectric multilayer for ultraviolet nanolithography overcoming a diffraction limit. The metamaterial consists of multilayer with Ag and photoresist (PR) layers.
Sang-Gil Park +3 more
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Nanoapertures without Nanolithography
ACS Photonics, 2018We propose and experimentally demonstrate the implementation of lithography-free nanoapertures on optical fibers.
Alessandro Tuniz +5 more
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Nanotechnologies and nanolithography in Europe
SPIE Proceedings, 2002European microelectronics industry recovered a strong position within last years, thanks in part to large cooperative programs involving both national and European funding. But, keeping in-line with Moore's law, entering the nano-era requires an increasingly effort in research and development.
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SPM nanolithography of hydroxy-silicates
Nanotechnology, 2012Bio-nanopatterning of surfaces is becoming a crucial technique with applications ranging from molecular and cell biology to medicine. Scanning probe microscopy (SPM) is one of the most useful tools for nanopatterning of flat surfaces. However, these patterns are usually built on homogeneous surfaces and require chemical functionalization to ensure ...
VALDRE', GIOVANNI +3 more
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Structural Consequences of Ferroelectric Nanolithography
Nano Letters, 2011Domains of remnant polarization can be written into ferroelectrics with nanoscale precision using scanning probe nanolithography techniques such as piezoresponse force microscopy (PFM). Understanding the structural effects accompanying this process has been challenging due to the lack of appropriate structural characterization tools.
Martin V. Holt +11 more
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Surface Plasmon Interference Nanolithography
Nano Letters, 2005A new nanophotolithography technique based on the interference of surface plasmon waves is proposed and demonstrated by using computer simulations. The wavelengths of the surface plasmon waves at metal and dielectric interfaces can reach the nanometer scale while their frequencies remain in the optical range. As a result, the resolution of this surface
Xiang Zhang, Zhaowei Liu, Qi-Huo Wei
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Projection XEUV-nanolithography
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2009A short review of present state of the art of projection photolithography is given. Progress and main problems of the EUV lithography have received primary consideration. Advantages of using synchrotrons as sources of EUV radiation in commercial EUV scanners are considered. Present state of the art of EUV lithography in Russia is reported.
N.N. Salashchenko, N.I. Chkhalo
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