Results 21 to 30 of about 4,510 (216)
Localized Photoactuation of Polymer Pens for Nanolithography
Localized actuation is an important goal of nanotechnology broadly impacting applications such as programmable materials, soft robotics, and nanolithography. Despite significant recent advances, actuation with high temporal and spatial resolution remains
Zhongjie Huang+5 more
doaj +1 more source
The Evolution of Dip‐Pen Nanolithography [PDF]
AbstractThe ability to tailor the chemical composition and structure of a surface on the 1–100 nm length scale is important to researchers studying topics ranging from electronic conduction, to catalysis, to biological recognition in nanoscale systems.
Ginger, David S.+2 more
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Magnetic Functionalization of Scanning Probes by Focused Electron Beam Induced Deposition Technology
The fabrication of nanostructures with high resolution and precise control of the deposition site makes Focused Electron Beam Induced Deposition (FEBID) a unique nanolithography process.
Javier Pablo-Navarro+3 more
doaj +1 more source
Soft Nanolithography by Polymer Fibers [PDF]
AbstractWe report on the use of polymer fibers for large‐area soft nanolithography on organic and inorganic surfaces with 50 nm resolution. The morphology of fibers and of the corresponding patterned gap is investigated, demonstrating a lateral dimension downscaling of up to nine times, which greatly increases the achieved resolution during pattern ...
D Tu+6 more
openaire +6 more sources
Thermal scanning probe lithography using Parylene C as thermal resist
Thermal scanning probe lithography is a direct‐write patterning method that uses a heated scanning probe tip to remove thermal resist. The most widely used thermal resist is polyphthalaldehyde. Another alternative thermal resist, Parylene C is introduced
Yun Jiang+4 more
doaj +1 more source
Applications of optically and electrically driven nanoscale bowtie antennas
Optical antennas play an important role in optical field manipulation. Among them, nanoscale bowtie antennas have been extensively studied for its high confinement and enhancement.
Zhongjun Jiang, Yingjian Liu, Liang Wang
doaj +1 more source
Proton beam writing: World experience and prospectives in Ukraine [PDF]
Proton beam writing is a promising lithography method that is being developed in many countries. This method has significant advantages over other lithography methods, amongst all, there is the absence of the need for prefabricated pattern masks and a ...
H. Ye. Polozhii+6 more
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Colloidal Quantum Dot Nanolithography: Direct Patterning via Electron Beam Lithography
Micro/nano patterns based on quantum dots (QDs) are of great interest for applications ranging from electronics to photonics to sensing devices for biomedical purposes.
Taewoo Ko+4 more
doaj +1 more source
Review of the 1st EUV Light Sources Code Comparison Workshop
We review the results of the 1st Extreme Ultraviolet (EUV) Light Sources Code Comparison Workshop. The goal of this workshop was to provide a platform for specialists in EUV light source plasma modeling to benchmark and validate their numerical codes ...
John Sheil+3 more
doaj +1 more source
Review on 3D Fabrication at Nanoscale
Among the different nanostructures that have been demonstrated as promising materials for various applications, three–dimensional (3D) nanostructures have attracted significant attention as building blocks for constructing high-performance nanodevices ...
Wang Ke+5 more
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