Results 31 to 40 of about 4,510 (216)

Alternative Masks for Nanolithography [PDF]

The Open Physical Chemistry Journal, 2007
The use of masks coming from research field as different as colloids, polymers or nanomaterials is a recently emerging field. Recent advances in this area have developed a variety of practical routes which have a great potential to overcome or at least complete the high-cost lithographic techniques.
openaire   +2 more sources

Nanofabrications of T shape gates for high electron mobility transistors in microwaves and THz waves, a review

Micro and Nano Engineering, 2021
High electron mobility transistors (HEMTs) are the basic building block in microwave monolithic integration circuits (MMICs) for broad applications in micrometer (0.3–100 GHz), millimeter (100–300 GHz) and tera [1] hertz (300 GHz–10 THz) wave.
Mingsai Zhu, Yuying Xie, Jinhai Shao, Yifang Chen   +3 more
doaj  

Optimization of Pt-C Deposits by Cryo-FIBID: Substantial Growth Rate Increase and Quasi-Metallic Behaviour

Nanomaterials, 2020
The Focused Ion Beam Induced Deposition (FIBID) under cryogenic conditions (Cryo-FIBID) technique is based on obtaining a condensed layer of precursor molecules by cooling the substrate below the condensation temperature of the gaseous precursor material.
Alba Salvador-Porroche, Soraya Sangiao, Patrick Philipp, Pilar Cea, José María De Teresa   +4 more
doaj   +1 more source

Nanostructured Surfaces and Detection Instrumentation for Photonic Crystal Enhanced Fluorescence

Sensors, 2013
Photonic crystal (PC) surfaces have been demonstrated as a compelling platform for improving the sensitivity of surface-based fluorescent assays used in disease diagnostics and life science research. PCs can be engineered to support optical resonances at
Brian T. Cunningham, Anusha Pokhriyal, Meng Lu, Vikram Chaudhery, Sherine George   +4 more
doaj   +1 more source

Recent Advances in Atomic Force Microscopy‐Based Local Anodic Oxidation Nanolithography of 2D Materials

Advanced Materials Interfaces, EarlyView.
This review summarizes the development of atomic force microscopy‐based local anodic oxidation technology for patterning 2D materials, discussing its mechanisms, applications in nanolithography and device fabrication, key influencing factors, existing challenges, and future prospects in nano‐designs.
Jing Yu, Abdulsalam Aji Suleiman, Jing‐Wen Shi, Ruey Jinq Ong, Francis Chi‐Chung Ling, Weiwen Zhang   +5 more
wiley   +1 more source

Parallel- and serial-contact electrochemical metallization of monolayer nanopatterns: A versatile synthetic tool en route to bottom-up assembly of electric nanocircuits

Beilstein Journal of Nanotechnology, 2012
Contact electrochemical transfer of silver from a metal-film stamp (parallel process) or a metal-coated scanning probe (serial process) is demonstrated to allow site-selective metallization of monolayer template patterns of any desired shape and size ...
Jonathan Berson, Assaf Zeira, Rivka Maoz, Jacob Sagiv   +3 more
doaj   +1 more source

Single Nanocrown Electrodes for High‐Quality Intracellular Recording of Cardiomyocytes

Advanced Materials Interfaces, EarlyView.
Intracellular recording devices featuring 1‐, 3‐, 5‐, and 9‐nanocrown electrode arrays (NcEAs) per channel, along with alternative electrode geometries, are developed. Comparative analysis shows that single NcEAs provide high‐fidelity intracellular action potentials, while multi‐nanocrown and non‐vertical electrodes yield distorted signals, emphasizing
Ching‐Ting Tsai, Hongyan Gao, Csaba Forro, Yang Yang, Viktoriya Shautsova, Xingyuan Zhang, Zeinab Jahed, Bianxiao Cui   +7 more
wiley   +1 more source

The atomic force microscope as a mechano–electrochemical pen

Beilstein Journal of Nanotechnology, 2011
We demonstrate a method that allows the controlled writing of metallic patterns on the nanometer scale using the tip of an atomic force microscope (AFM) as a “mechano–electrochemical pen”.
Christian Obermair, Andreas Wagner, Thomas Schimmel   +2 more
doaj   +1 more source

Biocompatible Porphyrin Derivatives Electron Beam and Extreme Ultraviolet Photoresists: High Resolution and High Etch Resistance

Advanced Materials Interfaces, EarlyView.
Porphyrin derivatives are introduced for electron beams and extreme ultraviolet lithography. The lithographic performance of the novel CuTP‐4Epoxy photoresist is excellent, with a resolution of 18 nm in EBL and 20 nm in EUVL, and the photoresist also exhibits high etch resistance.
Yurui Wu, Siliang Zhang, Xuewen Cui, Xue Cong, Shuang Liu, Lei Wang, Xudong Guo, Rui Hu, Shuangqing Wang, Jinping Chen, Yi Li, Jun Zhao, Shumin Yang, Yanqing Wu, Guoqiang Yang   +14 more
wiley   +1 more source

Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates

AIP Advances
We present a combined 1D imaging and broadband spectroscopy tool for analyzing laser-produced plasma sources of extreme ultraviolet light using a tapered zone plate that is dispersion-matched to a transmission grating. Specifically, we follow up on prior
Ievgeniia Babenko, Yahia Mostafa, Zoi Bouza, Oscar O. Versolato, Muharrem Bayraktar   +4 more
doaj   +1 more source