Results 51 to 60 of about 21,079 (276)

Applications of optically and electrically driven nanoscale bowtie antennas

open access: yesOpto-Electronic Science, 2022
Optical antennas play an important role in optical field manipulation. Among them, nanoscale bowtie antennas have been extensively studied for its high confinement and enhancement.
Zhongjun Jiang, Yingjian Liu, Liang Wang
doaj   +1 more source

Au-Ag template stripped pattern for scanning probe investigations of DNA arrays produced by Dip Pen Nanolithography

open access: yes, 2008
We report on DNA arrays produced by Dip Pen Nanolithography (DPN) on a novel Au-Ag micro patterned template stripped surface. DNA arrays have been investigated by atomic force microscopy (AFM) and scanning tunnelling microscopy (STM) showing that the ...
Alessandrini A.   +36 more
core   +1 more source

Subwavelength hole arrays with nanoapertures fabricated by scanning probe nanolithography [PDF]

open access: yesScience of Sintering, 2006
Owing to their surface plasmon-based operation, arrays of subwavelength holes show extraordinary electromagnetic transmission and intense field localizations of several orders of magnitude.
Jakšić Z.   +3 more
doaj   +1 more source

Review of the 1st EUV Light Sources Code Comparison Workshop

open access: yesAtoms, 2023
We review the results of the 1st Extreme Ultraviolet (EUV) Light Sources Code Comparison Workshop. The goal of this workshop was to provide a platform for specialists in EUV light source plasma modeling to benchmark and validate their numerical codes ...
John Sheil   +3 more
doaj   +1 more source

High On/Off Ratio Graphene Nanoconstriction Field Effect Transistor

open access: yes, 2010
We report a method to pattern monolayer graphene nanoconstriction field effect transistors (NCFETs) with critical dimensions below 10 nm. NCFET fabrication is enabled by the use of feedback controlled electromigration (FCE) to form a constriction in a ...
Goldsmith†, Brett   +5 more
core   +2 more sources

The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography.

open access: yesACS Applied Materials and Interfaces, 2020
Extreme Ultraviolet (EUV) lithography (13.5 nm) is the newest technology that allows high-throughput fabrication of electronic circuitry in the sub-20 nm scale.
I. Bespalov   +7 more
semanticscholar   +1 more source

An integral equation based numerical solution for nanoparticles illuminated with collimated and focused light [PDF]

open access: yes, 2009
To address the large number of parameters involved in nanooptical problems, a more efficient computational method is necessary. An integral equation based numerical solution is developed when the particles are illuminated with collimated and focused ...
Challener   +26 more
core   +2 more sources

Review on 3D Fabrication at Nanoscale

open access: yesAUTEX Research Journal, 2022
Among the different nanostructures that have been demonstrated as promising materials for various applications, three–dimensional (3D) nanostructures have attracted significant attention as building blocks for constructing high-performance nanodevices ...
Wang Ke   +5 more
doaj   +1 more source

Cryogenic Focused Ion Beam Milling to Investigate the Anisotropic Magnetotransport Properties of Bismuth Microcrystals

open access: yesAdvanced Functional Materials, EarlyView.
The highly anisotropic Fermi surface of bismuth results in variations in magnetotransport properties across different crystallographic directions, which can be characterized by studying microcrystals. To avoid the observed surface melting under room temperature Focused Ion Beam (FIB) irradiation, two low‐temperature FIB fabrication methods are proposed
Amaia Sáenz‐Hernández   +6 more
wiley   +1 more source

Theoretical investigation of subwavelength structure fabrication based on multi-exposure surface plasmon interference lithography

open access: yesResults in Physics, 2019
We propose a method of fabricating subwavelength structures based on multi-exposure surface plasmon interference lithography. This new nanolithography technique fabricates various subwavelength structures breaking the diffraction limit, which differs ...
Xiangxian Wang   +7 more
doaj   +1 more source

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