Results 51 to 60 of about 2,601 (165)

The atomic force microscope as a mechano–electrochemical pen

open access: yesBeilstein Journal of Nanotechnology, 2011
We demonstrate a method that allows the controlled writing of metallic patterns on the nanometer scale using the tip of an atomic force microscope (AFM) as a “mechano–electrochemical pen”.
Christian Obermair   +2 more
doaj   +1 more source

The impact of nanotechnology on textile coloration—A mini‐review

open access: yesColoration Technology, EarlyView.
Abstract Coloration is a key feature in the textile industry that adds value to the final apparels. This coloration of textile products is done by conventional methods which involve huge amounts of water pollution and wastages of textile colourants. Several approaches have been taken to eliminate these issues by advanced dyeing methods, however, due to
Solaiman Bin Ali   +2 more
wiley   +1 more source

Quantitative phase imaging with a multimode fiber

open access: yesAPL Photonics
Label-free quantitative phase imaging is vital for optical microscopy and metrology applications. A multimode fiber stands out as a desirable platform for imaging.
Aleksandra Ivanina   +4 more
doaj   +1 more source

Designing the Next Generation of Biomaterials through Nanoengineering

open access: yesAdvanced Materials, Volume 37, Issue 39, October 2, 2025.
Nanoengineering enables precise control over biomaterial interactions with living systems by tuning surface energy, defects, porosity, and crystallinity. This review highlights how these nanoscale design parameters drive advances in regenerative medicine, drug delivery, bioprinting, biosensing, and bioimaging, while outlining key translational ...
Ryan Davis Jr.   +3 more
wiley   +1 more source

Parallel- and serial-contact electrochemical metallization of monolayer nanopatterns: A versatile synthetic tool en route to bottom-up assembly of electric nanocircuits

open access: yesBeilstein Journal of Nanotechnology, 2012
Contact electrochemical transfer of silver from a metal-film stamp (parallel process) or a metal-coated scanning probe (serial process) is demonstrated to allow site-selective metallization of monolayer template patterns of any desired shape and size ...
Jonathan Berson   +3 more
doaj   +1 more source

Research on the influence of stamping materials on resist flow and the residual layer in thermal nanoimprint lithography

open access: yesMicro & Nano Letters, 2023
Various stamp materials can significantly affect the filling quality of nanoimprint lithography (NIL). The effects of different stamp materials on the imprinting process were investigated from the angles of residual layer (RL) thickness, contact pressure,
Hong‐Wen Sun   +5 more
doaj   +1 more source

Transformative 4D Printed SMPs into Soft Electronics and Adaptive Structures: Innovations and Practical Insights

open access: yesAdvanced Materials Technologies, Volume 10, Issue 19, October 7, 2025.
This review highlights recent advancements in 3DP techniques that incorporate emerging multifunctional SMP materials for applications in e‐electronics, soft actuators, biomedical devices, and more. Abstract Shape memory polymers (SMP) have recently gained significant attention as multifunctional materials for flexible and wearable electronics ...
Muhammad Yasir Khalid   +4 more
wiley   +1 more source

Understanding photoacoustic signal formation in the presence of transparent thin films

open access: yesPhotoacoustics
Strain-induced variation of the refractive index is the main mechanism of strain detection in photoacoustic experiments. However, weak strain-optic coupling in many materials limits the application of photoacoustics as an imaging tool.
Maksym Illienko   +2 more
doaj   +1 more source

Fabrication of AlGaN/GaN Fin-Type HEMT Using a Novel T-Gate Process for Improved Radio-Frequency Performance

open access: yesIEEE Access, 2020
To increase the radio-frequency (RF) performance of AlGaN/GaN-based fin-type high electron mobility transistors (HEMTs), a novel T-gate process was developed and applied to fabricate a device with high RF performance. In a single lithography process, the
Min Su Cho   +4 more
doaj   +1 more source

Recent Progress in Sub‐10 Nm Nanofabrication for Scaling Down 2D Transistors

open access: yesAdvanced Electronic Materials, Volume 11, Issue 16, October 6, 2025.
Sub‐10 nm 2D transistors fabrication: from lab to fab. Abstract 2D field‐effect transistors (2D‐FETs) leverage atomically thin, dangling‐bond‐free channels to overcome short‐channel effects and surface defects in sub‐10 nm nodes. However, conventional lithography hardly meets the requirement of sub‐10 nm nanofabrication because of resolution limits ...
Haichuan Li   +5 more
wiley   +1 more source

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