Results 61 to 70 of about 2,392 (161)
To increase the radio-frequency (RF) performance of AlGaN/GaN-based fin-type high electron mobility transistors (HEMTs), a novel T-gate process was developed and applied to fabricate a device with high RF performance. In a single lithography process, the
Min Su Cho +4 more
doaj +1 more source
Plasmon‐selective direct laser writing is demonstrated in mesoporous silica thin films containing plasmonic Au nanospheres. The key to attain plasmon‐selective polymerization is decoupling the plasmon wavelength from the absorption profile of coreactants, hence suppressing mutual radiative interactions.
Marius Kirsch +3 more
wiley +1 more source
Spectroscopic ellipsometry in the Kretschmann‐Raether configuration (KRSE) is employed to characterize a DNA‐functionalized platform for viral sequence recognition. By merging SE with surface plasmon resonance, KRSE outperforms conventional SE, achieving nanomolar targeting through resonance wavelength shifts (δλ) measurements. Its enhanced interfacial
Silvia Maria Cristina Rotondi +4 more
wiley +1 more source
Nanolithography using thermal stresses
A scalable nanolithography technique is demonstrated to realize nanogaps in Au electrodes using dissimilar thermal expansion coefficients of different layers.
Gangadhar Purohit +2 more
openaire +3 more sources
Magnetic Direct-Write Skyrmion Nanolithography
Magnetic skyrmions are stable spin textures with quasi-particle behavior and attract significant interest in fundamental and applied physics. The metastability of magnetic skyrmions at zero magnetic field is particularly important to enable, for instance, a skyrmion racetrack memory. Here, the results of the nucleation of stable skyrmions and formation
A. V. Ognev +16 more
openaire +5 more sources
This study demonstrates an aluminum‐based hybrid photoresist synthesized via molecular layer deposition (MLD) using trimethylaluminum and hydroquinone. The resist achieves sub‐20 nm resolution and virtually infinite silicon etch selectivity, enabling 40 nm‐wide, micrometer‐tall nanostructures.
Won‐Il Lee +8 more
wiley +1 more source
Vision Transformer network for optical overlay metrology on semiconductor wafers [PDF]
Fast and high-precision wafer metrology is critical for the semiconductor industry. In this work, we explore the use of simple and cost-effective optical sensors in combination with data-driven algorithms.
L. de Wolf +4 more
doaj +1 more source
Application of helium ion microscopy to nanostructured polymer materials
Helium ion microscopy (HIM) is a relatively new high-resolution nanotechnology imaging and nanofabrication tool. HIM offers a near-molecular resolution (approaching that of TEM) combined with a simplicity of sample preparation and high depth of field ...
Bliznyuk Valery N. +2 more
doaj +1 more source
Three-dimensional direct lithography of stable quantum dots in hybrid glass
Semiconductor quantum dots (QDs), as high-performance materials, play an essential role in contemporary industry, mainly due to their high photoluminescent quantum yield, wide absorption characteristics, and size-dependent light emission. It is essential
Dezhi Zhu +8 more
doaj +1 more source
High-Precision Solvent Vapor Annealing for Block Copolymer Thin Films
Despite its efficacy in producing well-ordered, periodic nanostructures, the intricate role multiple parameters play in solvent vapor annealing has not been fully established.
Gunnar Nelson +5 more
doaj +1 more source

