Results 61 to 70 of about 2,601 (165)
We present a combined 1D imaging and broadband spectroscopy tool for analyzing laser-produced plasma sources of extreme ultraviolet light using a tapered zone plate that is dispersion-matched to a transmission grating. Specifically, we follow up on prior
Ievgeniia Babenko+4 more
doaj +1 more source
Integrated Nanomanipulator With In-Process Lithography Inspection
Nanomanipulation techniques are extensively in use not only to reveal more characteristics of nano, micro and mesoscopic phenomena but also to build functional nano-devices that can bridge components between two or more scales to diversify the functions.
Samir Mekid
doaj +1 more source
Phase Mask Pinholes as Spatial Filters for Laser Interference Lithography
Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian‐shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography‐defined features vary
Giovanna Capraro+4 more
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Metasurface‐Assisted Optical Transparency of a Continuous Metal Film
Herein, a general strategy for realizing transparent conductors by sandwiching a continuous metal film between two metasurfaces is presented. A coupled‐mode theory model is developed to reveal the underlying physics and identify the optimal conditions.
Yifei Wang+4 more
wiley +1 more source
Conjugated nano-biological architectures interfacing solid nano-structured surfaces with biological polymers have gained significant attention due to their potential biosensing and biocatalytic applications.
Luis Gutierrez-Rivera+3 more
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Femtosecond Laser Plasmonic Nanolithography for Color Printing in Silicon
Synergistic ion implantation and femtosecond laser writing precisely control plasmonic nanoparticles (NPs) in silicon, creating tunable nanostructures. This method enables self‐assembled stripes, embedded nanorods, and semiembedded particles for applications in color printing, information storage, and ultrasensitive surface‐enhanced Raman scattering ...
Bo Wu+7 more
wiley +1 more source
With the rapid advances of extreme ultraviolet (EUV) lithography toward ultra-high resolution, characterization technique of EUV resists by interference lithography (IL) for 14-nm node process needs urgent upgrading because of the considerable loss of ...
Qingxin Wu+4 more
doaj +1 more source
Fluorescent two‐photon nanolithography
SummaryImproving the excitation conditions in two‐photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales. We demonstrate that a precise control of the illumination profile and the scanning speed of the laser beam is enough to decrease the photo‐polymerization volume of resins by orders of magnitude.
Kunik, Dario+3 more
openaire +4 more sources
Meta‐chemical surfaces for portable electrochemical sensors are developed using the DPN method. Sensitivity is influenced by the exposed surface, pattern pitch, and binding strength between the ligand and cations. Therefore, it can be regulated by altering these parameters, which is a significant result in the heavy‐metal sensor field.
Zorik Shamish+6 more
wiley +1 more source
How to Manufacture Photonic Metamaterials
Metamaterials boast applications such as invisibility and “hyperlenses” with resolution beyond the diffraction limit, but these applications haven’t been exploited in earnest and the market for them hasn’t grown much likely because facile and economical methods for fabricating them without defect has not emerged.
Apurba Paul, Gregory Timp
wiley +1 more source