Results 71 to 80 of about 2,392 (161)

Regional proximity effect correction for replicating 28 nm lines/spaces in HSQ as dielectric diffraction gratings with high aspect ratio

Micro and Nano Engineering
With the rapid advances of extreme ultraviolet (EUV) lithography toward ultra-high resolution, characterization technique of EUV resists by interference lithography (IL) for 14-nm node process needs urgent upgrading because of the considerable loss of ...
Qingxin Wu, Wentao Yuan, Qiucheng Chen, Hao Quan, Yifang Chen   +4 more
doaj   +1 more source

Fluorescent two‐photon nanolithography

Journal of Microscopy, 2008
SummaryImproving the excitation conditions in two‐photon fluorescent lithography reduces the size of the fabricated structures to nanometre scales. We demonstrate that a precise control of the illumination profile and the scanning speed of the laser beam is enough to decrease the photo‐polymerization volume of resins by orders of magnitude.
Kunik, Dario, Ludueña, Silvio Juan, Costantino, S., Martinez, Oscar Eduardo   +3 more
openaire   +3 more sources

Surface assembly and nanofabrication of 1,1,1-tris(mercaptomethyl)heptadecane on Au(111) studied with time-lapse atomic force microscopy

Beilstein Journal of Nanotechnology, 2014
The solution self-assembly of multidentate organothiols onto Au(111) was studied in situ using scanning probe nanolithography and time-lapse atomic force microscopy (AFM).
Tian Tian, Burapol Singhana, Lauren E. Englade-Franklin, Xianglin Zhai, T. Randall Lee, Jayne C. Garno   +5 more
doaj   +1 more source

High-throughput micro-nanostructuring by microdroplet inkjet printing

Beilstein Journal of Nanotechnology, 2018
The production of micrometer-sized structures comprised of nanoparticles in defined patterns and densities is highly important in many fields, ranging from nano-optics to biosensor technologies and biomaterials.
Hendrikje R. Neumann, Christine Selhuber-Unkel   +1 more
doaj   +1 more source

Charged particle single nanometre manufacturing

Beilstein Journal of Nanotechnology, 2018
Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject
Philip D. Prewett, Cornelis W. Hagen, Claudia Lenk, Steve Lenk, Marcus Kaestner, Tzvetan Ivanov, Ahmad Ahmad, Ivo W. Rangelow, Xiaoqing Shi, Stuart A. Boden, Alex P. G. Robinson, Dongxu Yang, Sangeetha Hari, Marijke Scotuzzi, Ejaz Huq   +14 more
doaj   +1 more source

Speckle-based 3D sub-diffraction imaging of sparse samples through a multimode fiber

APL Photonics
A flexible multimode fiber is an exceptionally efficient tool for in vivo deep tissue imaging. Recent advances in compressive multimode fiber sensing allow for imaging with sub-diffraction spatial resolution and sub-Nyquist speed.
Zhouping Lyu, Shih-Te Hung, Carlas S. Smith, Lyubov V. Amitonova   +3 more
doaj   +1 more source

nanolithography

Citation: 'nanolithography' in the IUPAC Compendium of Chemical Terminology, 5th ed.; International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. 10.1351/goldbook.09515 • License: The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International for individual terms.
openaire   +1 more source

Nanolithography [PDF]

, 2020
openaire   +2 more sources

Advancing nanolithography: a comprehensive review of materials for local anodic oxidation with AFM. [PDF]

Beilstein J Nanotechnol
Lorenzoni M.
europepmc   +1 more source

Transmission matrix of a multimode fiber: In-line vs off-axis holography. [PDF]

PLoS One
Ivanina A, Lochocki B, Koglbauer A, Sokolov S, Goorden SA, Amitonova LV.   +5 more
europepmc   +1 more source