Results 81 to 90 of about 4,510 (216)

Nanopipette/Nanorod-Combined Quartz Tuning Fork–Atomic Force Microscope

Sensors, 2019
We introduce a nanopipette/quartz tuning fork (QTF)–atomic force microscope (AFM) for nanolithography and a nanorod/QTF–AFM for nanoscratching with in situ detection of shear dynamics during performance.
Sangmin An, Wonho Jhe
doaj   +1 more source

Surface Organization and Nanopatterning of Collagen by Dip Pen Nanolithography [PDF]

, 2002
Donna L. Wilson, Raquel Martin, Mark Cronin‐Golomb, Chad A. Mirkin, David L. Kaplan   +4 more
openalex   +1 more source

Speckle-based 3D sub-diffraction imaging of sparse samples through a multimode fiber

APL Photonics
A flexible multimode fiber is an exceptionally efficient tool for in vivo deep tissue imaging. Recent advances in compressive multimode fiber sensing allow for imaging with sub-diffraction spatial resolution and sub-Nyquist speed.
Zhouping Lyu, Shih-Te Hung, Carlas S. Smith, Lyubov V. Amitonova   +3 more
doaj   +1 more source

Reversible mechano-electrochemical writing of metallic nanostructures with the tip of an atomic force microscope

Beilstein Journal of Nanotechnology, 2012
We recently introduced a method that allows the controlled deposition of nanoscale metallic patterns at defined locations using the tip of an atomic force microscope (AFM) as a “mechano-electrochemical pen”, locally activating a passivated substrate ...
Christian Obermair, Marina Kress, Andreas Wagner, Thomas Schimmel   +3 more
doaj   +1 more source

Nanopatterning of Functional Solid Structures by Dip Pen Nanolithography [PDF]

, 2003
Ming Su, Vinayak P. Dravid
openalex   +1 more source

Block copolymer micelle nanolithography on non-conductive substrates [PDF]

, 2004
Roman Glass, Marco Arnold, Elisabetta Ada Cavalcanti‐Adam, Jacques Blümmel, Christian Haferkemper, Charlotte Dodd, Joachim P. Spatz   +6 more
openalex   +1 more source

Nanolithography for VLSI and ULSI

Laser and Particle Beams, 1989
Lithography techniques hold the key to achieving ultra large-scale integration (ULSI) and they have been a major research subject. For fabrication of ULSI devices, a quarter micron or smaller pattern delineation with nanometer scale accuracy is required.
openaire   +2 more sources

Regional proximity effect correction for replicating 28 nm lines/spaces in HSQ as dielectric diffraction gratings with high aspect ratio

Micro and Nano Engineering
With the rapid advances of extreme ultraviolet (EUV) lithography toward ultra-high resolution, characterization technique of EUV resists by interference lithography (IL) for 14-nm node process needs urgent upgrading because of the considerable loss of ...
Qingxin Wu, Wentao Yuan, Qiucheng Chen, Hao Quan, Yifang Chen   +4 more
doaj  

Nano-chemistry and scanning probe nanolithographies [PDF]

, 2005
Ricardo Garcı́a, Ramsés V. Martínez, Javier Martı́nez   +2 more
openalex   +1 more source

Nanolithography on thin layers of PMMA using atomic force microscopy [PDF]

, 2005
Cristina Martin‐Olmos, Gemma Rius, Xavier Borrisé, Francesc Pérez‐Murano   +3 more
openalex   +1 more source