Results 131 to 140 of about 4,567 (180)
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Nanopattern insert molding

Nanotechnology, 2010
A new method was investigated to produce nanopatterns on polymeric surfaces with high resolution, good productivity, and low cost. It has certain advantages when compared with such conventional techniques as nanoimprint lithography (NIL), hot embossing, and injection molding.
S H, Kim, J H, Jeong, J R, Youn
openaire   +2 more sources

Nanopatterning by protein unfolding

Soft Matter, 2008
Molecular layers patterned on the nanoscale, with long-range order properties extending over the microscopic scale, have been obtained upon adsorption of commonly available proteins onto the hydrophobic and long-range ordered surface of pyrolytic graphite (HOPG).
SVALDO LANERO T.   +5 more
openaire   +3 more sources

Nanopatterning with Lithography

Journal of Chemical Education, 2005
In this Activity, students are introduced to the unique challenges of nanoscale fabrication. They will learn the general principles of serial and parallel nanofabrication techniques. Using a macroscale analogy, students explore the parallel fabrication technique known as nanosphere lithography to create patterns.
Christy L. Haynes   +3 more
openaire   +1 more source

Wetting of Nanopatterned Grooved Surfaces

Physical Review Letters, 2010
The wetting by perfluoromethylcyclohexane of a well-defined silicon grating with a channel width of 16 nm has been studied using transmission small angle x-ray scattering. Prefilling, capillary filling, and postfilling wetting regimes have been identified.
Hofmann, T.   +5 more
openaire   +3 more sources

Thermochemical nanopatterning of organic semiconductors

Nature Nanotechnology, 2009
Patterning of semiconducting polymers on surfaces is important for various applications in nanoelectronics and nanophotonics. However, many of the approaches to nanolithography that are used to pattern inorganic materials are too harsh for organic semiconductors, so research has focused on optical patterning and various soft lithographies. Surprisingly
Fenwick, Oliver   +6 more
openaire   +2 more sources

Nanopatterned monolayers of an adsorbed chromophore

Nanotechnology, 2008
A simple lift-off process was developed to rapidly fabricate nanopatterned photofunctional surfaces. Dye molecules of a perylene derivative (PDID) were adsorbed irreversibly on clean silicon through the holes of an electron-beam lithographied polymer mask. The subsequent removal of the mask in a proper solvent results in PDID nanosized regions of width
Frederich, Nadia   +6 more
openaire   +2 more sources

The nature of progress in nanopatterning

Nanotechnology, 2012
Developments in nanotechnology are making increasing demands on our ability to manipulate materials to designed patterns and structures. Patterning at increasingly diminished scales becomes very challenging, particularly with a view to manufacturing reproducible structures en masse.
openaire   +2 more sources

Air-Trapping on Biocompatible Nanopatterns

Langmuir, 2006
The occurrence of air-trapping inside poly-eta-caprolactone nanopits was investigated by measuring the contact angles of water droplets on a set of defined nanotopographies. It is shown that the advancing angles follow the Cassie-Baxter theory, thus revealing the presence of air bubbles inside the biodegradable nanopatterns.
Martines, Elena   +5 more
openaire   +3 more sources

A Liftoff Technique for Molecular Nanopatterning

Journal of Nanoscience and Nanotechnology, 2003
For quantum-dot cellular automata molecular electronic devices, one of the fundamental tasks is to arrange the molecules on a surface in a controlled manner. In this report, we discuss a molecular lift off technique to form nanopatterns toward the development of molecular circuits.
Qingling, Hang   +3 more
openaire   +2 more sources

Nanopatterning of ultrananocrystalline diamond nanowires

Nanotechnology, 2012
We report the fabrication of horizontally aligned ultrananocrystalline diamond (UNCD) nanowires (NWs) via two different approaches. First, with the top-down approach by using electron beam lithography (EBL) and reactive ion etching (RIE) with a photo resist layer as an etch mask.
Xinpeng, Wang   +3 more
openaire   +2 more sources

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