Results 251 to 260 of about 63,376 (340)

Ultrathin Monatomic Antimony Films by Sacrificial Atomic Layer Deposition for Phase Change Memory

Advanced Materials, Volume 38, Issue 8, 6 February 2026.
A three‐step sacrificial atomic layer deposition (s‐ALD) process enables wafer‐scale growth of ultrathin and uniform antimony (Sb) thin films. An ultrathin (≈4 nm) Sb film is uniformly deposited with its characteristic bilayer structure (Sb‐Sb) aligned along the substrate.
Gwangsik Jeon, Sangmin Jeon, Seunghwan Lee, Jeong Woo Jeon, Wonho Choi, Byongwoo Park, Sungjin Kim, Chanyoung Yoo, Hyejin Jang, Cheol Seong Hwang   +9 more
wiley   +1 more source

Broadband variable beamsplitter made of a subwavelength-thick metamaterial. [PDF]

Nanophotonics
Tamayama Y, Shibata Y.
europepmc   +1 more source

Stabilizing Oxygen Vacancies in Plasmonic WO3‐x Semiconductor Nanosheets via Surface Reconstruction Approach

Advanced Materials Interfaces, Volume 13, Issue 3, 3 February 2026.
This study reports a surface reconstruction strategy to stabilize oxygen vacancies in plasmonic WO3‐x nanosheets. By engineering a dense WO3 passivation layer, the authors effectively trap interior vacancies against environmental reoxidation. This architecture preserves strong localized surface plasmon resonance effects, resulting in significantly ...
Yuge Feng, Shuangqi Dong, Chao Wang, Zheng Wang, Tao Du, Zhaopeng Huang, Ajit Khosla, Hui Zhang   +7 more
wiley   +1 more source

Diffusion model-based inverse design of photonic crystals for customized refraction. [PDF]

Nanophotonics
Lin R, Zhang C, Mao W, Ge J, Dong H, Zhang L.   +5 more
europepmc   +1 more source

Active Physics Informed Deep Learning: Surrogate Modeling for Non Planar Wavefront Excitation of Topological Nanophotonic Devices [PDF]

Fatemeh Davoodi
openalex   +1 more source

Molecular Layer Deposited Aluminum‐Based Hybrid Resist for High‐Resolution Nanolithography and Direct Ultra‐High Aspect Ratio Pattern Transfer

Advanced Materials Technologies, Volume 11, Issue 3, 5 February 2026.
This study demonstrates an aluminum‐based hybrid photoresist synthesized via molecular layer deposition (MLD) using trimethylaluminum and hydroquinone. The resist achieves sub‐20 nm resolution and virtually infinite silicon etch selectivity, enabling 40 nm‐wide, micrometer‐tall nanostructures.
Won‐Il Lee, Dan N. Le, Matthew Yen, Melinda Lin, Ashwanth Subramanian, Xiao Tong, Nikhil Tiwale, Jiyoung Kim, Chang‐Yong Nam   +8 more
wiley   +1 more source

Nanophotonic Materials and Devices: Recent Advances and Emerging Applications. [PDF]

Micromachines (Basel)
Chou Chau YF.
europepmc   +1 more source

Screw‐Dislocation‐Engineered Quantum Dot: Geometry‐Tunable Nonlinear Optics, Orbital Qubit Addressability, and Torsion Metrology

Annalen der Physik, Volume 538, Issue 2, February 2026.
A uniform torsion field—representing a controlled density of parallel screw dislocations—confines a single electron into a geometry‐defined quantum dot. In a perpendicular magnetic field, an Aharonov–Bohm flux breaks the m↔−m$m \leftrightarrow -m$ symmetry and yields a flux‐ and torsion‐tunable angular pseudospin (m=±1)$(m = \pm 1)$ with asymmetric ...
Edilberto O. Silva
wiley   +1 more source

Demonstration of multiple-wavelength-band photonic integrated circuits using a silicon and silicon nitride 2.5D integration method. [PDF]

Nanophotonics
Fu M, Qiu H, Zhang H, Chen X, Qi J, Zhang Y, Xu Y, Liu S, Gu N, Yu H, Yi W, Li X, Guan X.   +12 more
europepmc   +1 more source

Topological Engineering of High‐Order Exceptional Points Through Transformation Optics

Laser &Photonics Reviews, Volume 20, Issue 3, 5 February 2026.
A novel framework leveraging transformation optics is introduced for engineering high‐order exceptional points (EPs) in nanophotonic systems. By linking these spectral singularities to physically accessible parameters, this approach enables the design of complex EPs, including third and fourth‐order EPs in coupled nanowire systems.
Kaiyuan Wang, Qi Jie Wang, Matthew R. Foreman, Yu Luo   +3 more
wiley   +1 more source