Results 151 to 160 of about 142,204 (279)

Simultaneous H2O:O2 Co‐Reactant Pulsing for Functional Property Control of Atomic Layer Deposited ZnO, TiO2, and Al2O3 Thin Films

open access: yesAdvanced Materials Interfaces, EarlyView.
Simultaneous H2O:O2 co‐pulsing in thermal ALD modulates surface hydroxylation to engineer nanovoids and properties in ZnO, TiO2, and Al2O3. The ligand‑dependent pathway promotes c‑axis‑textured ZnO, reduced‑crystallinity yet Ti4+‑preserved TiO2, and highly transparent, hydrophilic Al2O3, while lowering the refractive indices.
Ramin Ghiyasi, Maarit Karppinen
wiley   +1 more source

Accelerating Discovery to Deployment: Argonne's Materials Engineering Research Facility (MERF) and Its Role in Scaling Materials Technologies for Water and Resource Solutions

open access: yesAdvanced Materials Technologies, EarlyView.
In this Perspective, we highlight the processing science and scale‐up capabilities of the Materials Engineering Research Facility (MERF) at the U.S. Department of Energy's Argonne National Laboratory, with an emphasis on practical solutions for sustainable water and critical resource recovery. We demonstrate how national laboratories bridge fundamental
Yuepeng Zhang   +9 more
wiley   +1 more source

Advances in Solid‐Phase Processing Techniques: Innovations, Applications, and Future Perspectives

open access: yesAdvanced Materials Technologies, EarlyView.
Based on practical manufacturing challenges, this review examines advanced solid‐phase processing techniques that overcome the inherent limitations of conventional melting‐based and traditional solid‐phase manufacturing, enabling the production of higher‐performance components at reduced cost through process innovation and improved supply‐chain ...
Tianhao Wang
wiley   +1 more source

Amido‐Amine Co(II) Precursor‐Based Atomic/Molecular Layer Deposition Processes for Cobalt‐Organic Thin Films and Their Thermal Conversion to CoO Thin Films

open access: yesAdvanced Materials Technologies, EarlyView.
Three new atomic/molecular layer deposition processes are developed for Co‐organic thin films using a promising all‐nitrogen‐coordinated cobalt precursor. The study examines film growth, reaction mechanisms, chemical stability, and decomposition pathways of the resulting films through extensive characterization techniques and DFT calculations ...
Topias Jussila   +9 more
wiley   +1 more source

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