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1971
Optical emission spectroscopy includes the fields of flame-, arc-, and spark-induced emission phenomena in the UV, visible, and near IR regions of the electromagnetic spectrum. As a technique, it furnishes the analytical investigator with qualitative and quantitative information on the elemental composition of matter through simultaneous multielement ...
Armin P. Langheinrich, D. Blair Roberts
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Optical emission spectroscopy includes the fields of flame-, arc-, and spark-induced emission phenomena in the UV, visible, and near IR regions of the electromagnetic spectrum. As a technique, it furnishes the analytical investigator with qualitative and quantitative information on the elemental composition of matter through simultaneous multielement ...
Armin P. Langheinrich, D. Blair Roberts
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2003
Optical emission from a plasma occurs primarily through the electron impact excitation of atoms or molecules to an excited state, followed by a relaxation to a lower energy state releasing a photon containing an energy equal to the difference between these two energy states.
Francis F. Chen, Jane P. Chang
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Optical emission from a plasma occurs primarily through the electron impact excitation of atoms or molecules to an excited state, followed by a relaxation to a lower energy state releasing a photon containing an energy equal to the difference between these two energy states.
Francis F. Chen, Jane P. Chang
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Multisignal calibration in optical emission spectroscopy
Fresenius' Journal of Analytical Chemistry, 1993The possibility of using more than one line for calibration in optical emission spectroscopy has been investigated. By means of principal component regression, sensitivity can be increased and part of noise can be removed. Thus, lower limits of detection can be obtained.
Klaus Danzer, Michael Wagner
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Seasoning Optimization by Using Optical Emission Spectroscopy
2020 International Symposium on Semiconductor Manufacturing (ISSM), 2020From a point of view for AEC (Advanced/Autonomous Equipment Control) and APC (Advanced/Autonomous Process Control), it is necessary to catch up the condition from semiconductor manufacturing equipment in more detail and to monitor it more closely. After wet cleaning, it is difficult to determine the optimal number of seasoning wafers for the etch ...
Masahiro Shiga +11 more
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