Results 281 to 290 of about 6,149,165 (381)

V3101 Cyg: A Cataclysmic Variable Born with a Brown Dwarf Donor

open access: yes
Ramirez S   +7 more
europepmc   +1 more source

Periodic orbits indices [PDF]

open access: yesFundamenta Mathematicae, 1990
openaire   +1 more source

Low Resistance Interphase Formation at the PEO‐LiTFSI|LGPS Interface in Lithium Solid‐State Batteries

open access: yesAdvanced Materials Interfaces, EarlyView.
Interfacial charge transfer and low‐resistance interphase formation between PEO‐based polymer and Li10GeP2S12 solid electrolytes are investigated using multi‐electrode impedance spectroscopy and advanced analytical techniques such as XPS and ToF‐SIMS.
Ujjawal Sigar   +6 more
wiley   +1 more source

Photocatalytic Water Splitting on the Lunar Surface: Prospects for In Situ Resource Utilization

open access: yesAdvanced Materials Interfaces, EarlyView.
Water has been found in craters on the moon nearby locations which are illuminated >80% of the time. Photocatalysis uses energy from sunlight to drive chemical reactions such as water splitting to produce oxygen and hydrogen. It is a scalable technology that requires lighter equipment and utilizes resources available on the moon. ABSTRACT The discovery
Ranjani Kalyan   +6 more
wiley   +1 more source

Light‐Controlled Exposure of Cancer Cells to Reactive Oxygen Species Using Organic Semiconductor Thin Films

open access: yesAdvanced Materials Interfaces, EarlyView.
Spin‐coated films of the conjugated polymer F8T2 (poly (9,9‐dioctylfluorene‐alt‐bithiophene)) generate superoxide at the film‐medium interface, enabling precise delivery of reactive oxygen species (ROS) as visible‐light “ROS patches.” Coated surfaces drive rapid, localised cytotoxicity in MCF7 cancer monolayers under white light, providing a reagent ...
Joe Kaye   +8 more
wiley   +1 more source

Atomic Layer Deposition of Highly Conducting NiS2 Thin Films from Elemental Sulfur

open access: yesAdvanced Materials Interfaces, EarlyView.
A simple new atomic layer deposition (ALD) process yields in‐situ crystalline and electrically conducting nickel disulfide thin films. This deposition process is based on two solid and safe precursors, nickel acetylacetonate and elemental sulfur. ABSTRACT A novel atomic layer deposition (ALD) process for highly conducting nickel disulfide thin films is
Juha Linjala   +5 more
wiley   +1 more source

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