Results 91 to 100 of about 1,028 (199)

Diffusion Layers with Ti and Ti+Al Formed on 316L Austenitic Steel by a Pack Cementation Procedure

open access: yes, 2011
Pack cementation procedure implies the use of a powder mixture containing the diffusive elements, which in our case are either Ti or Ti+Al, Al2O3 and NHCl as activator.
Mircea Olteanu   +3 more
core   +1 more source

Aluminizing via Ionic Liquid Electrodeposition and Pack Cementation: A Comparative Study with Inconel 738 and a CoNiCrAlY

open access: yes, 2017
A novel aluminizing process based upon room temperature Al-electrodeposition from Ionic Liquids followed by diffusion heat treatment was applied on bare- and CoNiCrAlY-coated Inconel 738 (IN738). The aluminized samples were tested by isothermal oxidation
Andrea Giaccherini   +7 more
core   +1 more source

Research progress on preparation technology of molybdenum disilicide coating

open access: yesFenmo yejin jishu
Molybdenum disilicide (MoSi2) coating has the excellent high-temperature oxidation resistance which is widely used as a protective coating of various materials.
HAN Jiayu   +9 more
doaj   +1 more source

Revestimentos de silicetos de nióbio para a melhoria da resistência à oxidação por pack cementation [PDF]

open access: yes, 2019
Orientadora: Profa. Dra. Ana Sofia Clímaco Monteiro D’OliveiraDissertação (mestrado) - Universidade Federal do Paraná, Setor de Tecnologia, Programa de Pós-Graduação em Engenharia Mecânica. Defesa : Curitiba, 10/09/2019Inclui referências: p. 71-75Resumo:
Pinto, Beatriz Aparecida, 1993-
core  

A study of aluminide coatings on TiAl alloys by the pack cementation method

open access: yes, 2019
The lower case halide-activated pack cementation method was utilized to deposit aluminide coatings on TiAl alloys. Emphasis was placed on the effect of alloying elements on the aluminizing behavior of TiAl alloy.
Gong, SK, Xu, HB, Kim, KY, Zhou, CG
core   +1 more source

Experimental and thermodynamic considerations of Mg2Si coatings deposited by pack cementation process

open access: yes, 2017
Magnesium disilicide is a narrow gap semiconductor which can be used in several applications such as thermoelectric materials, optoelectronic devices and batteries. It has attracted special attraction because of its low cost and non-toxicity.
Stathokostopoulos, D.   +6 more
core   +1 more source

Novel Cr/Si-Slurry Diffusion Coatings for High Temperatures. [PDF]

open access: yesMaterials (Basel), 2023
Kerbstadt M, White EMH, Galetz MC.
europepmc   +1 more source

Tailoring the Silicon Cementation Applied to P265GH Grade Steel

open access: yes
Increasing the serviceability of industrial components intended for the petrochemical industry is possible through their superficial saturation with silicon (silicon cementation).
Mihai Branzei   +3 more
core   +1 more source

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