Results 271 to 280 of about 13,292,654 (316)
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On the Patterns and Wealth Effects of Vertical Mergers*
The Journal of Business, 2002We use industry commodity flows information to measure vertical relations for completed mergers during 1962 to 1996. Almost one-third of the mergers display relations that provide opportunities for vertical integration between merging firms. Vertical mergers generate positive wealth effects that are significantly larger compared with those for ...
Po Hung Joseph P. H. Fan +1 more
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Effective Characterization of Relief Patterns
Computer Graphics Forum, 2018AbstractIn this paper, we address the problem of characterizing relief patterns over surface meshes independently on the underlying shape. We propose to tackle the problem by estimating local invariant features and encoding them using the Improved Fisher Vector technique, testing both features estimated on 3D meshes and local descriptors estimated on ...
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Effects of Anesthesia on Breathing Pattern
1978In recent years, it has been shown that in anesthetized cats an inverse relationship is observed between the tidal volume (VT) and the inspiratory duration (TI) when VT increases as a result of hypercapnia or transient artificial inflations. This relationship, sometimes found as hyperbolic, has been related to the BreuerHering reflex since, after ...
H, Gautier, J H, Gaudy, M, Bonora
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Effects of Hypoxia on the Circadian Patterns in Men
High Altitude Medicine & Biology, 2003We tested the hypothesis that acute hypoxia may alter the circadian pattern of body temperature in adult humans. Six healthy subjects were studied in normoxia, hypoxia (approximately 13% inspired O(2)), and again normoxia, each session lasting >24 h and spaced a few days apart, with a constant routine protocol of sustained wakefulness and minimal ...
BOSCO, GERARDO +6 more
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The Temporal Course of Visual Pattern Encoding: Effects of Pattern Goodness
The Quarterly Journal of Experimental Psychology Section A, 1983Subjects typically display superior reproduction of good (redundant, symmetrical) visual patterns compared with poor ones. This pattern goodness effect could conceivably involve encoding processes, short-term memory processes, or response processes.
E S, Howe, C J, Brandau
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Effect of pattern luminance profile on the pattern erg in man and pigeon
Vision Research, 1987Pattern electroretinograms (PERGs) have been recorded in man and pigeon using phase reversing patterns. Studies were made in both species of the effect of grating spatial frequency, grating profile (sine or square) or the size of the squares of a checkerboard on the amplitude of the responses. The results obtained in the two species were similar.
, Vaegan, G B, Arden
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Enzyme Patterns of Glycolysis in Rabbit Gingiva and Effects of pH on the Patterns
Journal of Dental Research, 1982The specific activities of individual enzymes associated with glycolysis in rabbit gingiva were systematically evaluated, and the enzyme patterns at pH 7.4 were established on the glycolytic and gluconeogenic pathways. As a result, it was suggested that there was no capability for gluconeogenesis.
K, Suzuki, T, Fujiwara, F, Kuwata
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Effect of Pattern Configuration on the Relation between Pattern Area and Pattern Discrimination
Perceptual and Motor Skills, 1970To explore the possibility that brightness-area disparity in sub-portions of correct and incorrect patterns contributes to improved learning with increasing pattern area, hooded rats were tested with two discrimination problems: high disparity (triangle apex-up versus triangle apex-down) and low disparity (triangle apex-left versus triangle apex-right).
Merrill F. Elias, Laurel Warner
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2004
Chemical-mechanical polishing (CMP) is used in integrated circuit manufacturing to remove material from patterned wafer surfaces. The term “polishing” or “planarization” is used to describe two types of processes: 1) topography reduction of surface features that result from deposition, etch, or other thin-film processes, and 2) removal (“polish back ...
D. Boning, D. Hetherington
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Chemical-mechanical polishing (CMP) is used in integrated circuit manufacturing to remove material from patterned wafer surfaces. The term “polishing” or “planarization” is used to describe two types of processes: 1) topography reduction of surface features that result from deposition, etch, or other thin-film processes, and 2) removal (“polish back ...
D. Boning, D. Hetherington
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Effect of visual noise on pattern recognition
Experimental Brain Research, 2005We recognize objects even when they are partially degraded by visual noise. Using monkeys performing a sequential delayed match-to-sample task, we studied the relation between the amount of visual noise (5, 10, 15, 20 or 25%) degrading the eight black and white stimuli used here, and the accuracy and speed with which matching stimuli were identified ...
Munetaka, Shidara, Barry J, Richmond
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