Results 11 to 20 of about 38,259 (291)

Contact Photolithography at Sub-Micrometer Scale Using a Soft Photomask

open access: yesMicromachines, 2019
This paper proposes a method for improving the patterning resolution of conventional contact photolithography from the micrometer, down to the sub-micrometer scale.
Chun-Ying Wu, Heng Hsieh, Yung-Chun Lee
doaj   +2 more sources

Research on photolithography graphic pattern transfer technology

open access: yes上海师范大学学报. 自然科学版, 2014
The process of the photolithography were introduced in this paper,including pre-baking,the photoresist coating,soft baking,alignment and exposure,post-exposure baking,development,hard baking.Then we mainly discussed the problems in the photolithography ...
ZHANG Yongping   +10 more
doaj   +1 more source

Investigation of Inkjet-Printed Masks for Fast and Easy Photolithographic NIL Masters Manufacturing

open access: yesMicromachines, 2023
Modern optical systems often require small, optically effective structures that have to be manufactured both precisely and cost-effectively. One option to do this is using nanoimprint lithography (NIL), in which the optical structures are replicated as ...
Selina Burkert   +2 more
doaj   +1 more source

Improved MSRN-Based Attention Block for Mask Alignment Mark Detection in Photolithography

open access: yesApplied Sciences, 2022
Wafer chips are manufactured in the semiconductor industry through various process technologies. Photolithography is one of these processes, aligning the wafer and scanning the circuit pattern on the wafer on which the photoresist film is formed by ...
Juyong Park, Jongpil Jeong
doaj   +1 more source

Scalable Fabrication of Nanogratings on GaP for Efficient Diffraction of Near-Infrared Pulses and Enhanced Terahertz Generation by Optical Rectification

open access: yesCrystals, 2022
We present a process flow for wafer-scale fabrication of a surface phase grating with sub-micron feature sizes from a single semiconductor material. We demonstrate this technique using a 110-oriented GaP semiconductor wafer with second-order nonlinearity
Mohammad Bashirpour   +3 more
doaj   +1 more source

The Variables and Invariants in the Evolution of Logic Optical Lithography Process

open access: yesJournal of Microelectronic Manufacturing, 2019
Photolithography has been a major enabler for the continuous shrink of the semiconductor manufacturing design rules. Throughout the years of the development of the photolithography, many new technologies have been invented and successfully implemented ...
Qiang Wu
doaj   +1 more source

Fabrication of High‐Performance Devices on Water‐Soluble Lead Halide Perovskites Using Water‐Based Photolithography

open access: yesAdvanced Materials Interfaces, 2023
The alluring optoelectronic properties of lead halide perovskites have continued to attract enormous interest from the scientific community. They are among the brightest candidates for future optoelectronic devices.
Gokul M. A., Atikur Rahman
doaj   +1 more source

A Genetic Algorithm-Enhanced Sensor Marks Selection Algorithm for Wavefront Aberration Modeling in Extreme-UV (EUV) Photolithography

open access: yesInformation, 2023
In photolithographic processes, nanometer-level-precision wavefront-aberration models enable the machine to be able to meet the overlay (OVL) drift and critical dimension (CD) specifications.
Aris Magklaras   +4 more
doaj   +1 more source

Fabrication and Performance Evaluation of the Helmholtz Resonator Inspired Acoustic Absorber Using Various Materials

open access: yesMicromachines, 2020
A soundwave is transmitted by adjacent molecules in the medium, and depending on the type of sound, it exhibits various characteristics such as frequency, sound pressure, etc. If the acoustic wavelength of the soundwave is sufficiently long compared with
Sung Ho Lee   +4 more
doaj   +1 more source

Cell Migration According to Shape of Graphene Oxide Micropatterns

open access: yesMicromachines, 2016
Photolithography is a unique process that can effectively manufacture micro/nano-sized patterns on various substrates. On the other hand, the meniscus-dragging deposition (MDD) process can produce a uniform surface of the substrate.
Sung Eun Kim   +11 more
doaj   +1 more source

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