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Direct Photo-Patterning of Ultra-Bright and Stable Quantum Dot Light-Emitting Diodes Using Small-Molecule Crosslinkers. [PDF]
SmallDai S +10 more
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Analysis of birefringence modulation performance in RM-embedded CO-polymer waveguides. [PDF]
iScienceWang T +6 more
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Fluorinated copolymer resists for high-resolution negative-tone lithography: Preparation and patterning performance. [PDF]
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Nonreciprocal scattering and implications for thermal emission control on a mid-infrared spatiotemporally modulated metasurface. [PDF]
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Advances in surfactants for photolithography
Advances in Colloid and Interface ScienceThe advancement of dense integrated circuits requires the miniaturization of feature sizes, which has driven continuous progress in photolithography. However, there are still some challenges in achieving a high patterning resolution for photolithography such as surface contaminants, defect formation, pattern collapse, etc.
Guojie Wang
exaly +3 more sources
Physical Chemistry Chemical Physics, 2014
Photolithography is a crucial technology for both research and industry. The desire to be able to create ever finer features has fuelled a push towards lithographic methods that use electromagnetic radiation or charged particles with the shortest possible wavelength.
John T, Fourkas, John S, Petersen
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Photolithography is a crucial technology for both research and industry. The desire to be able to create ever finer features has fuelled a push towards lithographic methods that use electromagnetic radiation or charged particles with the shortest possible wavelength.
John T, Fourkas, John S, Petersen
openaire +2 more sources
Photolithography based on nanocrystals
Science, 2017Surface chemistry of all-inorganic nanomaterials enables three-dimensional ...
Striccoli, Marinella
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AIP Conference Proceedings, 1984
In this paper we describe experiments using a molecular fluorine (i.e., F2 dimer) laser operating at 157 nm as a vacuum ultraviolet (VUV) source for high resolution photolithography. The F2 excimer laser is now the only commercially available laser with high average power at a wavelength as short as 157 nm.
J. C. White +4 more
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In this paper we describe experiments using a molecular fluorine (i.e., F2 dimer) laser operating at 157 nm as a vacuum ultraviolet (VUV) source for high resolution photolithography. The F2 excimer laser is now the only commercially available laser with high average power at a wavelength as short as 157 nm.
J. C. White +4 more
openaire +1 more source
SPIE Proceedings, 2004
We will review the evolution of photolithography since its implementation in production of semiconductor IC devices. We will show how, at every forecast end of its existence, we have found new ways to prolong its life well beyond what was thought possible, and are now considering driving it to the limits of Physics.
Masaomi Kameyama, Martin McCallum
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We will review the evolution of photolithography since its implementation in production of semiconductor IC devices. We will show how, at every forecast end of its existence, we have found new ways to prolong its life well beyond what was thought possible, and are now considering driving it to the limits of Physics.
Masaomi Kameyama, Martin McCallum
openaire +1 more source