Results 281 to 290 of about 73,280 (324)
Diffraction-limit-breaking digital projection lithography via multi-exposure strategies for high-density nanopatterning. [PDF]
Microsyst NanoengLiang ZX +5 more
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Room-temperature solution processing of high-mobility MoS<sub>2</sub> thin films. [PDF]
Nat CommunXue J +13 more
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Ultrafast Dynamics and Rearrangement of the EUV Photoacid Generator Phenyl Triflate. [PDF]
J Phys Chem LettKwon S, Stamm J, Dantus M.
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Novel MEMS Multisensor Chip for Aerodynamic Pressure Measurements. [PDF]
Sensors (Basel)Lazić Ž +10 more
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Characterization of dry-film photolithography for the study of B. burgdorferi motility
, 2017 Arttur Pudas
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Physical Chemistry Chemical Physics, 2014
Photolithography is a crucial technology for both research and industry. The desire to be able to create ever finer features has fuelled a push towards lithographic methods that use electromagnetic radiation or charged particles with the shortest possible wavelength.
John T, Fourkas, John S, Petersen
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Photolithography is a crucial technology for both research and industry. The desire to be able to create ever finer features has fuelled a push towards lithographic methods that use electromagnetic radiation or charged particles with the shortest possible wavelength.
John T, Fourkas, John S, Petersen
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AIP Conference Proceedings, 1984
In this paper we describe experiments using a molecular fluorine (i.e., F2 dimer) laser operating at 157 nm as a vacuum ultraviolet (VUV) source for high resolution photolithography. The F2 excimer laser is now the only commercially available laser with high average power at a wavelength as short as 157 nm.
J. C. White +4 more
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In this paper we describe experiments using a molecular fluorine (i.e., F2 dimer) laser operating at 157 nm as a vacuum ultraviolet (VUV) source for high resolution photolithography. The F2 excimer laser is now the only commercially available laser with high average power at a wavelength as short as 157 nm.
J. C. White +4 more
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Electrochemical X‐ray Photolithography
Angewandte Chemie International Edition, 2012Recent progress in information technologies has made microand nanolithography key processes in modern industry. Today these methods are among the most rapidly developing areas in both science and engineering. In the last two decades, wellknown and widespread methods of photoand electron-beam lithography have been complemented by a number of novel ...
Andrei A, Eliseev +4 more
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Photolithography based on nanocrystals
Science, 2017Surface chemistry of all-inorganic nanomaterials enables three-dimensional ...
Striccoli, Marinella
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Reduction Photolithography Using Microlens Arrays: Applications in Gray Scale Photolithography
Analytical Chemistry, 2002This paper describes the application of reduction photolithography, using arrays of microlenses and gray scale masks, to generate arrays of micropatterns having multilevel and curved features in photoresist. This technique can fabricate, in a single exposure, three-dimensional microstructures (e.g., nonspherical microlens arrays) over areas of ...
Hongkai, Wu +2 more
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