Results 291 to 300 of about 73,280 (324)
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Japanese Journal of Applied Physics, 1978
Methacrylates PMMA, P(MMA-MA)and FBM can be satisfactorily used as photoresist. FBM has the sensitivity 7 times higher than the PMMA standard developing system. PGMA and P(GMA-EA) have the positive working behaviors. The chrome-on-quartz substrate mask is suitable as a photomask.
Yoshiaki Mimura +3 more
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Methacrylates PMMA, P(MMA-MA)and FBM can be satisfactorily used as photoresist. FBM has the sensitivity 7 times higher than the PMMA standard developing system. PGMA and P(GMA-EA) have the positive working behaviors. The chrome-on-quartz substrate mask is suitable as a photomask.
Yoshiaki Mimura +3 more
openaire +1 more source
Photolithography illumination needs
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1985Abstract Industrial photolithographic exposures are now performed almost entirely with the high pressure mercury arc, using one or more of the spectral lines at 365, 408 and 436 nm. It would be difficult for the free electron laser to replace the entrenched and reliable arc unless it could offer a significant improvement, for instance, in brightness.
Douglas S. Goodman, Janusz Wilczynski
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SPIE Proceedings, 2004
We will review the evolution of photolithography since its implementation in production of semiconductor IC devices. We will show how, at every forecast end of its existence, we have found new ways to prolong its life well beyond what was thought possible, and are now considering driving it to the limits of Physics.
Masaomi Kameyama, Martin McCallum
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We will review the evolution of photolithography since its implementation in production of semiconductor IC devices. We will show how, at every forecast end of its existence, we have found new ways to prolong its life well beyond what was thought possible, and are now considering driving it to the limits of Physics.
Masaomi Kameyama, Martin McCallum
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Third Topical Meeting on Optical Interference Coatings, 1984
Microlithography is used to transfer a geometrical pattern from a mask to a substrate. The principle of the process is similar to any imaging method. A source emits radiation which may consist of photons, electrons, or ions. An object represented by a layout on a mask will be imaged by an optical system to a receptor called a photoresist. The radiation
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Microlithography is used to transfer a geometrical pattern from a mask to a substrate. The principle of the process is similar to any imaging method. A source emits radiation which may consist of photons, electrons, or ions. An object represented by a layout on a mask will be imaged by an optical system to a receptor called a photoresist. The radiation
openaire +1 more source
2013 39th Annual Northeast Bioengineering Conference, 2013
Smriti Rajagopalan +4 more
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Smriti Rajagopalan +4 more
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