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Photolithography based on nanocrystals
Science, 2017Surface chemistry of all-inorganic nanomaterials enables three-dimensional ...
Striccoli, Marinella
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Physical Chemistry Chemical Physics, 2014
Photolithography is a crucial technology for both research and industry. The desire to be able to create ever finer features has fuelled a push towards lithographic methods that use electromagnetic radiation or charged particles with the shortest possible wavelength.
John T. Fourkas, John S. Petersen
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Photolithography is a crucial technology for both research and industry. The desire to be able to create ever finer features has fuelled a push towards lithographic methods that use electromagnetic radiation or charged particles with the shortest possible wavelength.
John T. Fourkas, John S. Petersen
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SPIE Proceedings, 2004
We will review the evolution of photolithography since its implementation in production of semiconductor IC devices. We will show how, at every forecast end of its existence, we have found new ways to prolong its life well beyond what was thought possible, and are now considering driving it to the limits of Physics.
Masaomi Kameyama, Martin McCallum
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We will review the evolution of photolithography since its implementation in production of semiconductor IC devices. We will show how, at every forecast end of its existence, we have found new ways to prolong its life well beyond what was thought possible, and are now considering driving it to the limits of Physics.
Masaomi Kameyama, Martin McCallum
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Adaptive control of photolithography
SPIE Proceedings, 1991AbstractAdaptive control techniques, with their capability for providing satisfactory control even when the process changes with time, are promising candidates for dealing with common problems encountered in photolithography processing such as batch‐to‐batch variations in resist properties and inconsistencies in resist curing.
Duncan A. Mellichamp +3 more
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Electrochemical X‐ray Photolithography [PDF]
Angewandte Chemie International Edition, 2012 Recent progress in information technologies has made microand nanolithography key processes in modern industry. Today these methods are among the most rapidly developing areas in both science and engineering. In the last two decades, wellknown and widespread methods of photoand electron-beam lithography have been complemented by a number of novel ...
Irina Snigireva +4 more
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Surface Engineering with Polymer Brush Photolithography.
Macromolecular rapid communications, 2020Surface-tethered macromolecules, or polymer brushes, offer a unique platform for coating surfaces for a wide variety of applications. Surface-initiated polymerization (SI-P), through which polymer brushes can be grown directly from an initiator ...
Michele Fromel +2 more
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Neon recovery for photolithography
2017 40th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO), 2017Neon is a rare noble gas present in the atmosphere that is utilized for a host of industrial applications. For semiconductor manufacturing, the gas is used as a component in gas mixes used to generate laser light for DUV photolithography. For these applications, the gas is mixed with argon and fluorine in excimer lasers to generate laser light with a ...
Chris Ebert +3 more
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AIP Conference Proceedings, 1984
In this paper we describe experiments using a molecular fluorine (i.e., F2 dimer) laser operating at 157 nm as a vacuum ultraviolet (VUV) source for high resolution photolithography. The F2 excimer laser is now the only commercially available laser with high average power at a wavelength as short as 157 nm.
L. D. Jackel +4 more
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In this paper we describe experiments using a molecular fluorine (i.e., F2 dimer) laser operating at 157 nm as a vacuum ultraviolet (VUV) source for high resolution photolithography. The F2 excimer laser is now the only commercially available laser with high average power at a wavelength as short as 157 nm.
L. D. Jackel +4 more
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Data analysis for photolithography
Microelectronic Engineering, 1999This paper will propose standard methodologies for analyzing common lithographic data in three areas: photoresist contrast curves, swing curves, and focus-exposure matrices. For most data types, physics-based algebraic equations will be proposed to fit the data.
Sven Jug, Dale A. Legband, Chris A. Mack
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Advances in Materials
Organic ion‐gated transistors (OIGTs) demonstrate commendable performance for versatile neuromorphic systems. However, due to the fragility of organic materials to organic solvents, efficient and reliable all‐photolithography methods for scalable ...
Xu Liu +14 more
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Organic ion‐gated transistors (OIGTs) demonstrate commendable performance for versatile neuromorphic systems. However, due to the fragility of organic materials to organic solvents, efficient and reliable all‐photolithography methods for scalable ...
Xu Liu +14 more
semanticscholar +1 more source