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Photolithography on Porous Silicon
2014Methods to transfer a pattern into porous silicon using light are reviewed. These methods can be applied before, during, or after the anodization processes. The advantages and disadvantages of each method are noted and technical performance compared using the aspect ratio of the pattern transferred into the porous silicon as a key metric. Based on this
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Toward Practical, Subwavelength, Visible-Light Photolithography with Hyperlens.
ACS Nano, 2018The future success of semiconductor technology relies on the continuing reduction of the feature size, allowing more components per chip and higher speed.
Jingbo Sun, N. Litchinitser
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Advances in surfactants for photolithography
Advances in Colloid and Interface ScienceThe advancement of dense integrated circuits requires the miniaturization of feature sizes, which has driven continuous progress in photolithography. However, there are still some challenges in achieving a high patterning resolution for photolithography such as surface contaminants, defect formation, pattern collapse, etc.
Bin, Hu+5 more
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Solar astrometry by photolithography
Solar Physics, 1990Observed temporal variations of shape and size of the solar disk as viewed from Earth may act as constraints for theories of the interior of the Sun. In addition to existing programs of solar diameter measurements we investigate a ground-based photographic method.
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Resist Materials for Photolithography
IETE Technical Review, 1986Rapid advancement of semiconductor technology demands increase in chip size and density of components, which requires finer resolution. This demand dictates technology innovations in exposure tools, resist materials and etching techniques. This article is an effort to understand photoresist materials and to evaluate their merits which are necessary for
K.C. Chhabra+3 more
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Contrast enhanced photolithography
IEEE Electron Device Letters, 1983This paper introduces a new method, contrast enhancement, which improves the imaging properties of conventional photoresist through the use of a photobleachable layer applied to the resist surface. Contrast enhancement allows high contrast photopatterns to be formed even when low contrast illumination is used.
B.F. Griffing, P.R. West
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Subwavelength photolithography and microscopy
SPIE Proceedings, 2012The resolutions of the optical microscope and the optical lithography are both limited by the well-known Rayleigh limit. Rabi oscillation is a coherent nonlinear process that can modulate the population distribution between two energy states and also modulate the resonant fluorescence spectrum.
Zeyang Liao+3 more
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Fundamentals of Microfabrication and Nanotechnology, Three-Volume Set, 2018
Photolithography is a multi-step lithography process in which user-defined patterns are transferred to substrates with the help of ultraviolet light and a pattern-carrying mask.
In Short
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Photolithography is a multi-step lithography process in which user-defined patterns are transferred to substrates with the help of ultraviolet light and a pattern-carrying mask.
In Short
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ACS Applied Materials and Interfaces, 2016
We demonstrate a new patterning technique for gallium-based liquid metals on flat substrates, which can provide both high pattern resolution (∼20 μm) and alignment precision as required for highly integrated circuits.
C. Park+9 more
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We demonstrate a new patterning technique for gallium-based liquid metals on flat substrates, which can provide both high pattern resolution (∼20 μm) and alignment precision as required for highly integrated circuits.
C. Park+9 more
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Quantum dot patterning by direct photolithography
Nature Nanotechnology, 2022Junpeng Fan, Lei Qian
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