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Photolithography with VUV Lasers
Conference on Lasers and Electro-Optics, 1984We describe experiments using a molecular fluorine (i.e., F2 dimer) laser operating at 157 nm as a VUV source for high-resolution photolithography. The F2 excimer laser is now the only commercially available laser with high average power at a wavelength as short as 157 nm.
Obert R. Wood +4 more
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Metrology Methods in Photolithography
2017The photolithography process consists of aligning and optically transferring the pattern from a reticle onto a partially processed wafer that has been coated with photoresist. The resist is then developed and the resist image transferred into the underlying material by a chemical and/or thermal step (i.e., dry/wet etch, sinter, implant, etc.).
Laurie J. Lauchlan +2 more
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Trends in photolithography materials
2010New trends on materials for photolithography are ...
Cesar Garza, Will Conley
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Anisotropic Aerogels by Photolithography
2011A general method is presented that allows fabrication of sol–gel materials with anisotropic physical properties. The gelation solvent is exchanged with a suitable solution of precursors and suitable chemical reactions are triggered in irradiated regions of the monoliths.
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Wavefront Engineering for Photolithography
Physics Today, 1993Physicists have always been fascinated by the very small. These days, the inner structures of everyday items such as the personal computer fall into that size category and warrant our interest. The critical dimensions of individual features of state-of-the-art memory chips are now as small as 500 nanometers and are getting smaller.
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Invention of Lithography and Photolithography
2010Before beginning this journey through how lithography and subsequently photolithography came into existence, and how the technology has evolved ever since, it is necessary to review the cultural, scientific, and technological framework out of which these planographic printing techniques emerged.
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Infrared Transmission Polarizers by Photolithography
Applied Optics, 1967The design of a grid polarizer is discussed and the effect of supporting it on various substrates is evaluated using a transmission line analogy. A method of making such a grid polarizer by photolithographic techniques is described, and measurements on a device suitable for use at wavelengths between 20 micro and several hundred microns are presented ...
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