Results 41 to 50 of about 69,644 (326)
Information, 2023 In photolithographic processes, nanometer-level-precision wavefront-aberration models enable the machine to be able to meet the overlay (OVL) drift and critical dimension (CD) specifications.
Aris Magklaras +4 more
doaj +1 more source
International Journal of Mechanical System Dynamics, 2021 As one of the most advanced and precise equipment in the world, a photolithography scanner is able to fabricate nanometer‐scale devices on a chip. To realize such a small dimension, the optical system is the fundamental, but the mechanical system often ...
Yi Song +4 more
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Polariton quantum boxes in semiconductor microcavities [PDF]
, 2006 We report on the realization of polariton quantum boxes in a semiconductor microcavity under strong coupling regime. The quantum boxes consist of mesas that confine the cavity photon, etched on top of the spacer of a microcavity.
Baas, Augustin +7 more
core +3 more sources
Investigation of Inkjet-Printed Masks for Fast and Easy Photolithographic NIL Masters Manufacturing
Micromachines, 2023 Modern optical systems often require small, optically effective structures that have to be manufactured both precisely and cost-effectively. One option to do this is using nanoimprint lithography (NIL), in which the optical structures are replicated as ...
Selina Burkert +2 more
doaj +1 more source
Expanding Glycomic Investigations through Thiol-Derivatized Glycans
Molecules, 2023 N-(2-thioethyl)-2-aminobenzamide (TEAB), a novel glycan auxiliary, was synthesized and its utility was evaluated. The auxiliary was conjugated to glycans by reductive amination with the water-stable reagent 2-picoline borane complex.
Robert D. Hurst +2 more
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Advanced Engineering Materials, EarlyView.This study explores the effects of pixel size and spacing when fabricating electroluminescent (EL) multipixel displays. COMSOL simulations identify the impact of pixel dimensions and spacing on electric field distribution and lighting efficiency. Flexible, high‐resolution EL pixel arrays are reverse offset printed, achieving a 96% reduction in pixel ...
Huanghao Dai +3 more
wiley +1 more source
Crystals, 2022 We present a process flow for wafer-scale fabrication of a surface phase grating with sub-micron feature sizes from a single semiconductor material. We demonstrate this technique using a 110-oriented GaP semiconductor wafer with second-order nonlinearity
Mohammad Bashirpour +3 more
doaj +1 more source
Dual field alignment display and control for electron micropattern generator [PDF]
, 1972 Application of electron beam lithography to replace photolithography process in fabrication of integrated circuits is discussed. Procedure for using electron beam lithography equipment is described.
Malmberg, P. R., Okeeffe, T. W.
core +1 more source
Nonlinear optical properties of photoresists for projection lithography [PDF]
, 1996 Optical beams are self-focused and self-trapped upon initiating crosslinking in photoresists. This nonlinear optical phenomenon is apparent only for low average optical intensities and produces index of refraction changes as large as 0.04.
Kewitsch, Anthony S., Yariv, Amnon
core +1 more source
Bio-inspired functional surface fabricated by electrically assisted micro-embossing of AZ31 magnesium alloy [PDF]
, 2020 Developing bio-inspired functional surfaces on engineering metals is of extreme importance, involving different industrial sectors, like automotive or aeronautics.
Cao, Jian +9 more
core +2 more sources