Results 71 to 80 of about 69,644 (326)

Fabrication of High‐Performance Devices on Water‐Soluble Lead Halide Perovskites Using Water‐Based Photolithography

open access: yesAdvanced Materials Interfaces, 2023
The alluring optoelectronic properties of lead halide perovskites have continued to attract enormous interest from the scientific community. They are among the brightest candidates for future optoelectronic devices.
Gokul M. A., Atikur Rahman
doaj   +1 more source

Multilayer Soft Photolithography Fabrication of Microfluidic Devices Using a Custom-Built Wafer-Scale PDMS Slab Aligner and Cost-Efficient Equipment

open access: yesMicromachines, 2022
We present a robust, low-cost fabrication method for implementation in multilayer soft photolithography to create a PDMS microfluidic chip with features possessing multiple height levels.
Trieu Nguyen   +5 more
doaj   +1 more source

Low-temperature, dry transfer-printing of a patterned graphene monolayer

open access: yes, 2015
Graphene has recently attracted much interest as a material for flexible, transparent electrodes or active layers in electronic and photonic devices.
Cha, Minjeong   +4 more
core   +1 more source

Photolithographic Mask Fabrication Process Using Cr/Sapphire Carriers [PDF]

open access: yes, 2019
Elaboration of the technology of novel photolithographic masks fabricated on sapphire substrates for UV and DUV application was described. The main technological steps of mask fabrication as Cr metallization deposition, selection of resist for ...
Paszkiewicz, Regina   +2 more
core   +2 more sources

Integration of Perovskite/Low‐Dimensional Material Heterostructures for Optoelectronics and Artificial Visual Systems

open access: yesAdvanced Functional Materials, EarlyView.
Heterojunctions combining halide perovskites with low‐dimensional materials enhance optoelectronic devices by enabling precise charge control and improving efficiency, stability, and speed. These synergies advance flexible electronics, wearable sensors, and neuromorphic computing, mimicking biological vision for real‐time image analysis and intelligent
Yu‐Jin Du   +11 more
wiley   +1 more source

APPLICATIONS OF UV-LIGA AND GRAYSCALE LITHOGRAPHY FOR DISPLAY TECHNOLOGIES

open access: yesDoklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki, 2019
In the article MEMS technologies for display production and application presented. UV-LIGA and greyscale lithography based on SU-8 resist approaches were shown. Methods, technologies and structures of heterogeneous materials with soft magnetic properties,
I. V. Timoshkov   +6 more
doaj   +1 more source

Improved MSRN-Based Attention Block for Mask Alignment Mark Detection in Photolithography

open access: yesApplied Sciences, 2022
Wafer chips are manufactured in the semiconductor industry through various process technologies. Photolithography is one of these processes, aligning the wafer and scanning the circuit pattern on the wafer on which the photoresist film is formed by ...
Juyong Park, Jongpil Jeong
doaj   +1 more source

Low‐Loss Far‐Infrared Surface Phonon Polaritons in Suspended SrTiO3 Nanomembranes

open access: yesAdvanced Functional Materials, EarlyView.
The low‐loss, highly confined, and thickness‐tunable surface phonon polaritons are demonstrated in the far‐infrared regime within transferable freestanding SrTiO3 membranes, achieving high figures of merit comparable to the previous record values from the vdW materials.
Konnor Koons   +8 more
wiley   +1 more source

Multilayer Edge Molecular Devices Based on Plasma Oxidation of Photolithographically Defined Bottom Metal Electrode

open access: yes, 2011
A multilayer edge molecular electronics device (MEMED), which utilize the two metal electrodes of a metal-insulator-metal tunnel junction as the two electrical leads to molecular channels, can overcome the long standing fabrication challenges for ...
Tyagi, Pawan
core   +1 more source

Exploring Vacuum Casting Techniques for Micron and Submicron Features [PDF]

open access: yes, 2004
A study of resolution limits in standard rapid prototyping vacuum cast molding processes and adaptation of this technique to reach submicron accuracy is proposed.
Denoual, M., Lepioufle, B., Mognol, P.
core   +1 more source

Home - About - Disclaimer - Privacy