Results 201 to 210 of about 17,195 (246)
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Static and dynamic photoresist shrinkage effects in EUV photoresists
SPIE Proceedings, 2012Photoresist shrinkage (a.k.a. line slimming) is an important systematic uncertainty source in critical dimension-scanning electron microscope (CD-SEM) metrology of lithographic features [1][2][3][4][5]. In terms of metrology gauge metrics, it influences both the precision and the accuracy of CD-SEM measurements, while locally damaging the sample ...
Benjamin Bunday +3 more
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A Polyurethane‐Based Positive Photoresist
Macromolecular Rapid Communications, 2014Polyurethane (PU) monomer mixtures containing commercially available o‐nitrobenzyl‐based photocleavable monomers have been formulated and tested as low‐cost positive tone photoresists. The photolysis reaction is studied by UV spectroscopy. Well‐defined micropatterns on 2 μm thick photodegradable PU films are obtained using 365 nm light exposure.
Garcia-Fernandez, L. +2 more
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Photoresist ultrafiltration optimization
SPIE Proceedings, 1998Advanced semiconductor devices can suffer from a plethora ofdefects, some of which are attributable to the processes used for their manufacture and others which are inherent to the materials used to fabricate the device. As the level of integration in these devices continues to become more sophisticated, so too must the detection techniques and ...
George M. Jordhamo +2 more
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Positive Photoresist Chemistry
1991The present paper describes chemistry of naphthoquinone diazide (NQD) — novolak type positive photoresists focusing on the reactions of NQD. NQD is a highly reactive compound and has been known to render various kinds of reactions, among which photochemical, thermal and base catalyzed reactions are very important for the positive photoresist chemistry.
M. Murata, M. Koshiba, Y. Harita
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