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Recent Advances in Positive Photoresists: Mechanisms and Fabrication
MaterialsKaiying Wang +2 more
exaly
Linewidth Variations in Photoresist Patterns on Profiled Surfaces
IEEE Transactions on Electron Devices, 1975exaly
New Photoresist Coating Method for 3-D Structured Wafers
Sensors and Actuators A: Physical, 2000exaly
Photoresist and monomer and polymer for composing the photoresist
1997MAEDA KATSUMI +3 more
openaire +1 more source

