Results 1 to 10 of about 230,990 (187)

Production of radioisotopes within a plasma focus device [PDF]

Nuclear Technology and Radiation Protection, 2005
In recent years, research conducted in the US and in Italy has demonstrated production of radioisotopes in plasma focus devices, and particularly, on what could be termed "endogenous" production, to wit, production within the plasma it self, as opposed ...
Angeli Ergisto, Tartari Agostino, Frignani Michele, Molinari Vincenzo, Mostacci Domiziano, Rocchi Federico, Sumini Marco   +6 more
doaj   +8 more sources

Low-Energy Plasma Focus Device as an Electron Beam Source [PDF]

The Scientific World Journal, 2014
A low-energy plasma focus device was used as an electron beam source. A technique was developed to simultaneously measure the electron beam intensity and energy. The system was operated in Argon filling at an optimum pressure of 1.7 mbar.
Muhammad Zubair Khan, Yap Seong Ling, Ibrar Yaqoob, Nitturi Naresh Kumar, Lim Lian Kuang, Wong Chiow San   +5 more
doaj   +5 more sources

Analysis of Deterioration in a Plasma Focus Device [PDF]

Journal of Physics: Conference Series, 2018
Indexación: Scopus.The Plasma Focus (PF) is a kind of dense transient plasmas in with high-pulsed voltage. To produce devices for eld application it is necessary to obtain PF equipment able to operate for a long period of time.
Avaria, G., Bora, B., Davis, S., Jain, J., López, E., Moreno, J., Pavez, C., Pedreros, J., Soto, L., Zanelli, D.   +9 more
core   +3 more sources

Hundred joules plasma focus device as a potential pulsed source for in vitro cancer cell irradiation [PDF]

AIP Advances, 2017
Plasma focus devices may arise as useful source to perform experiments aimed to study the effects of pulsed radiation on human cells in vitro. In the present work, a table top hundred joules plasma focus device, namely “PF-400J”, was adapted to irradiate
J. Jain, J. Moreno, R. Andaur, R. Armisen, D. Morales, K. Marcelain, G. Avaria, B. Bora, S. Davis, C. Pavez, L. Soto   +10 more
doaj   +3 more sources

The plasma parameters and neutron yield at device of "Plasma focus"

Physical Sciences and Technology, 2019
Present work presents calculations and experimental studies on the formation and dynamics of plasma on the “plasma focus” set up. Physical conditions were determined and critical parameters were calculated for estimating the neutron yield for kilojoule ...
A. M. Zhukeshov, Zh. M. Moldabekov, A. Ioffe   +2 more
doaj   +4 more sources

Enhancing radiosensitivity of melanoma cells through very high dose rate pulses released by a plasma focus device. [PDF]

PLoS ONE, 2018
Radiation therapy is a useful and standard tumor treatment strategy. Despite recent advances in delivery of ionizing radiation, survival rates for some cancer patients are still low because of recurrence and radioresistance.
Francesca Buontempo, Ester Orsini, Isabella Zironi, Lorenzo Isolan, Alessandra Cappellini, Stefania Rapino, Agostino Tartari, Domiziano Mostacci, Giorgio Cucchi, Alberto Maria Martelli, Marco Sumini, Gastone Castellani   +11 more
doaj   +2 more sources

DNA damage and cell death induced by exposure to ultra-high dose rate low-dose pulsed X-rays emitted from a kilojoule plasma focus device [PDF]

Biological Research
Background FLASH radiotherapy, characterized by ultra-high dose rates (> 40 Gy/s), potentially spares normal tissues while maintaining antitumor efficacy (the FLASH effect).
Héctor Araya, Jalaj Jain, Rodrigo Andaur, José Moreno, Sergio Davis, Pablo Diaz, Ethel Velásquez, Josefa Orellana, Martín Ríos, Jessica Toro, Octavio Orellana-Serradell, Cristopher Fierro, Leopoldo Soto, Katherine Marcelain   +13 more
doaj   +2 more sources

Correction: Enhancing radiosensitivity of melanoma cells through very high dose rate pulses released by a plasma focus device. [PDF]

PLoS ONE, 2018
[This corrects the article DOI: 10.1371/journal.pone.0199312.].
PLOS ONE Staff
doaj   +2 more sources

Enhancing uniformity in HARC etching via edge bias voltage and structural impedance variations in a rectangular voltage waveform [PDF]

Scientific Reports
In the semiconductor industry, plasma etching has become a key process for fabricating precise and reliable patterns with high aspect ratios capacitors (HARC), allowing for complex device architectures.
Chanho Park, Jinill Cho, Junghwan Um, Taesung Kim   +3 more
doaj   +2 more sources

Discussion of plasma focus parameters and gain/loss energy ‎processes for a designed plasma focus device

St. Petersburg Polytechnical University Journal: Physics and Mathematics
In this research, a design for a dense plasma focus device has been developed, the plasma-focus parameters and the processes of gain/loss energy have been studied using the Lee code.
Nassif Alaa, Sahyouni Walid, Zeidan Ola
doaj   +2 more sources