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Plasma Modelling for Magnetic Control
2016The aim of this chapter is to derive a linearized mathematical model describing the interaction between the plasma ring and the voltages applied to the poloidal field coils.
Marco Ariola, Alfredo Pironti
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Magnetics control simulations for KSTAR plasmas
Fusion Engineering and Design, 2002Abstract Simulation studies on magnetics control for the proposed Korea Superconducting Tokamak Advanced Research (KSTAR) plasmas are presented. Here, the magnetics control includes the fast time scale (∼10 ms) plasma position control, the slow time scale (∼1 s) plasma shape and current control, and the control of resistive wall modes (RWM).
Hogun Jhang, Jin-Yong Kim
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Improving magnetic plasma control for ITER
Fusion Engineering and Design, 2014Abstract Several alternative plasma control schemes using the same plasma current and shape controller (SC) with different plasma vertical stabilisation (VS) controllers are explored, assessing their efficiency in the suppression of plasma shape transients after vertical displacement event (VDE) disturbances and their robustness to changes of the ...
S. Gerkšič, DE TOMMASI, GIANMARIA
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Plasma Control in Tokamaks. Part 3.1. Plasma Magnetic Control Systems in ITER
2020The plasma magnetic control systems for ITER (International Thermonuclear Experimental Reactor) are presented. The systems comprise original engineering solutions for plasma position, current and shape control for the two versions of ITER: ITER-1 and ITER-2, including those designed in V. A. Trapeznikov Institute of Control Sciences of the RAS.
Mitrishkin, Yuri Vladimirovich +3 more
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Magnetic field control of reactive plasma etching
Applied Physics Letters, 1979The application of a magnetic field to control the spatial distribution of chemical species in reactive plasma etching produces a situation in which either etching or deposition can occur. In a low-voltage hot-filament triode configuration in which the plasma is confined by an externally applied magnetic field, Si samples are subjected to a CF4 plasma.
V. J. Minkiewicz +4 more
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Modified magnetic controlled plasma sputtering method
Vacuum, 1996A modified method to improve thin film vacuum sputtering is presented. This method is capable of controlling the sputtering plasma via an external set of magnets, in a similar fashion to the tetrode sputtering method. The main advantage of Magnetic Controlled Plasma Sputtering (MCPS) is its ability to independently control all deposition parameters ...
G Golan, A Axelevitch, E Rabinovich
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The Madistor-A Magnetically Controlled Semiconductor Plasma Device
Proceedings of the IRE, 1962The madistor is a new active device which makes use of the effects of a magnetic field on an injection plasma in a semiconductor. The formation of an injection plasma has been observed in p-type InSb at temperatures below 100°K as donor traps become saturated by electrons injected through a forward biased n+p junction. In an appropriately designed n+pp+
I. Melngailis, R. Rediker
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A magnetically controlled arc for plasma torch incineration
IEEE Conference Record - Abstracts. 1996 IEEE International Conference on Plasma Science, 2002Summary form only given. With the ever increasing problems of chemically hazardous and radioactive waste produced from federal, commercial, medical, academic, and nuclear utility sources, a safe means of waste elimination or disposal is desired. Plasma torches represent an electrical arc technology that possesses certain advantages in radioactive and ...
P.Y. Peterson +5 more
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