Results 251 to 260 of about 311,496 (336)
Functionalized Antifouling Polymer Brushes for Biospecific Surfaces
Modern biosensors offer high sensitivity but often struggle with long‐term stability and selectivity for specific targets. Antifouling polymer brushes help enhance both stability and selectivity. In this review, we compare recent antifouling coatings, their design parameters, and how they are integrated with biorecognition elements for improved ...
Erik J. Postma+4 more
wiley +1 more source
Polyethylene Glycol Diacrylate Adapted Photopolymerization Material for Contact Lens with Improved Elastic Modulus Properties. [PDF]
Chen Y, Li D, Chen Y, Fang H.
europepmc +1 more source
Spatially Controlled 3‐D Multiplexed Aptamer Patterning in Hydrogels
A hydrogel platform based on norbornene‐functionalized polyvinyl alcohol enables high‐resolution, 3‐D multiplexed patterning of DNA aptamers via two‐photon polymerization. Two distinct aptamers are covalently immobilized with single micron‐scale precision across the x, y, and z dimensions.
Kevin Roost+9 more
wiley +1 more source
Metabolomic and Proteomic Analyses Unveil That Polyethylene Glycol-Polycaprolactone-Loaded Curcumin Nanoparticles Induce Mitochondrial Dysfunction and Metabolic Reprogramming to Suppress Melanoma Growth. [PDF]
Zhang Y+16 more
europepmc +1 more source
Solution‐Processable Polymer Nanocomposites for Electromagnetic Interference Shielding
This review introduces scalable strategies for fabricating solution‐processable polymer nanocomposites with improved electromagnetic interference (EMI) shielding performance. It compares three fabrication methods, including solution blending, in situ polymerization, and Pickering emulsion polymerization, and highlights their respective advantages in ...
Tuan Sang Tran+3 more
wiley +1 more source
Polyethylene Glycol (PEG) Application Triggers Plant Dehydration but Does Not Accurately Simulate Drought. [PDF]
Kylyshbayeva G+4 more
europepmc +1 more source
Porphyrin derivatives are introduced for electron beams and extreme ultraviolet lithography. The lithographic performance of the novel CuTP‐4Epoxy photoresist is excellent, with a resolution of 18 nm in EBL and 20 nm in EUVL, and the photoresist also exhibits high etch resistance.
Yurui Wu+14 more
wiley +1 more source
Reaction of Polyethylene Glycol with Cyanuric Chloride
Kiwamu Kitamura+2 more
openalex +2 more sources