Results 301 to 310 of about 121,616 (347)

Ion-assisted pulsed-laser deposition

Review of Scientific Instruments, 1995
Ion bombardment on the surface of a substrate during deposition of a thin film [ion-assisted (IA) deposition] is used to control thin-film crystalline orientation and phase. Ion-assisted deposition is demonstrated with the relatively new pulsed-laser deposition (PLD) technique, a method of thin-film growth that has shown promise for the synthesis of ...
R. P. Reade, S. R. Church, R. E. Russo
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Pulsed laser vaporization and deposition

Reviews of Modern Physics, 2000
Photons have many advantages for vaporizing condensed systems, and laser vaporization sources have a flexibility not available with other methods. These sources are applied to making thin films in the well-known technique of pulsed laser deposition (PLD). The vaporized material may be further processed through a pulsed secondary gas, lending the source
P. R. Willmott, J. R. Huber
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Pulsed laser deposition of CdWO4

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1997
Abstract Pulsed laser depositions of CdWO4 thin films are carried out in the presence of O2 using targets of CdWO4(010) single crystals and pressed CdO and WO3 powder mixtures. CdWO4(002) peaks are observed on Si(111), CaF2(111), mica(001) and glass substrates by ablating CdWO4(010) single crystals.
Katsumi Tanaka, Natsuki Shirai, Iichiro Sugiyama, Rhohei Nakata   +3 more
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Pulsed-Laser Deposition

1994
Abstract This article presents a general description of pulsed-laser deposition. It describes the components of pulsed-laser deposition equipment. The article also discusses the effects of angular distribution of materials. Finally, the article reviews the characteristics of high-temperature superconductors and ferroelectric materials.
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Pulsed Laser Deposition: Future Directions

MRS Bulletin, 1992
Despite the discovery of the laser a few decades ago, the potential for pulsed laser deposition (PLD) of thin films has remained unexploited. Despite the sustained pioneering work at Rockwell in laser deposition, it took the development of high-temperature superconductors to fully realize the technique's potential. Early work on PLD of high-temperature
T. Venkatesan, X.D. Wu, R. Muenchausen, A. Pique   +3 more
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Pulsed-laser deposition of polytetrafluoroethylene

Journal of Materials Research, 1995
Thin films of polytetrafluoroethylene have been deposited on amorphous substrates by the pulsed-laser deposition technique. By transmission electron microscopy, the polymer films were shown to consist of both amorphous and crystalline components. The data for the crystalline component are consistent with it being highly ordered with the long helical ...
Wenbiao Jiang, M. Grant Norton, Lancy Tsung, J. Thomas Dickinson   +3 more
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Pulsed laser deposition: analysis and deposition of SmBaCuO films

Applied Surface Science, 1998
Abstract Composition and time evolution of the gas plume were investigated during a PLD of SmBaCuO thin films. Optical emission spectroscopy was employed for investigating the laser-induced plasma plume. The mean velocity of ions has been estimated to be slower when the experiment is performed in the presence of a buffer gas.
A Di Trolio, U Gambardella, A Morone, S Orlando, G P Parisi   +4 more
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Liquid target pulsed laser deposition

Applied Physics Letters, 1995
A novel pulsed laser deposition (PLD) technique using a liquid target has been developed. The technique overcomes the problem of solid target deterioration under high power laser irradiation and prevents splashing of large particulates on the substrate. Choosing an organic liquid containing carbon and hydrogen as a testing target, we have obtained high
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Pulsed-laser deposition of selenium

Journal of Materials Science, 1995
The preparation and characterization of amorphous selenium thin films grown by pulsed-laser deposition (PLD) is presented. Two laser excitation regimes at 1064 and 532 nm were studied. Interesting relations between the surface quality and the different experimental parameters were found. High-purity thin films were produced with surface quality similar
M. Fernández-Guasti, E. Haro-Poniatowski, R. Diamant, L. Ponce, E. Jiménez   +4 more
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Mirrorlike pulsed laser deposited tungsten thin film

Review of Scientific Instruments, 2011
Mirrorlike tungsten thin films on stainless steel substrate deposited via pulsed laser deposition technique in vacuum (10−5 Torr) is reported, which may find direct application as first mirror in fusion devices. The crystal structure of tungsten film is analyzed using x-ray diffraction pattern, surface morphology of the tungsten films is studied with ...
A T T, Mostako, C V S, Rao, Alika, Khare
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