Pulsed laser deposition - Open Access .click

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1999
We present the historical background and the main development trends of a very rapidly growing research field: pulsed laser deposition for obtaining high-quality thin films for use in science and technology. We emphasize the main physical phenomena involved, such as the role of the plasma in the deposition process, the relation between the irradiation ...
I. N. Mihailescu, E. György
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Pulsed laser deposition of nasicon thin films

Applied Surface Science, 1996
Abstract We have deposited NASICON (Na SuperIonicCONductor) films of thicknesses ranging from 100 to 600 nm, by Pulsed Laser Deposition (PLD), onSiO2Si substrates. The deposition rates varied from6 × 10−3 to 0.08 nm/pulse depending on the conditions employed. XPS measurements show that all elements are transferred from the target to the substrate and
R. Izquierdo +7 more
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Nonequilibrium Interlayer Transport in Pulsed Laser Deposition

Physical Review Letters, 2006
We use time-resolved surface x-ray diffraction measurements with microsecond range resolution to study the growth kinetics of pulsed laser deposited . Time-dependent surface coverages corresponding to single laser shots were determined directly from crystal truncation rod intensity transients. Analysis of surface coverage evolution shows that extremely
J Z, Tischler +5 more
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Pulsed Laser Deposition of Carbon Nanofoam