Results 281 to 290 of about 391,384 (337)

Laser-pulse sputtering of atoms and molecules .2. Recondensation effects

1994
When solids are sputtered with sufficiently intense laser pulses, particle release takes place, and a terminating expansion then develops. The resulting gas-dynamic processes depend on whether backscattered particles are subject to recondensation or reflection. We here wish to examine the problem further with emphasis on-recondensation effects.
R. Kelly, Miotello, Antonio
openaire   +1 more source

Separating Thermal, Electronic, and Topographic Effects in Pulsed Laser Melting and Sputtering of Gold

Physical Review Letters, 1996
An attempt was made to separate thermal from electronic effects during laser sputtering of gold by partitioning the target surface energy between steady-state electron beam heating and pulsed laser heating. For flat starting surfaces and a peak surface temperature of $\ensuremath{\sim}2700\mathrm{K}$, the Au translational energy remains $(2\ensuremath{-
, Bennett, , Krajnovich, , Grigoropoulos
openaire   +2 more sources

AlN thin films deposited by pulsed laser ablation, sputtering and filtered arc techniques

Thin Solid Films, 2001
Abstract The present work describes the growth and characterization of AlN thin films deposited by pulsed laser deposition (PLD), DC magnetron sputtering and filtered arc techniques. The focus of this paper is not only on the optimization of process parameters for the production of device quality thin AlN films, but also to investigate deposition ...
Ravi Bathe, R.D Vispute, Dan Habersat, R.P Sharma, T Venkatesan, C.J Scozzie, Matt Ervin, B.R Geil, A.J Lelis, S.J Dikshit, R Bhattacharya   +10 more
openaire   +1 more source

Comparison Of Aln Films Synthesized By Pulsed Laser Ablation And Magnetron Sputtering Techniques

MRS Proceedings, 1997
ABSTRACTA comparative study is reported on the aluminum nitride (AIN) films on Si (111) substrate deposited by pulsed laser deposition and reactive magnetron sputtering. The structure, bonding characteristics, relative impurity levels, and wear resistance have been investigated to compare these films. We have used the techniques such as high resolution
K. Jagannadham, A. K. Sharma, Q. Wei, R. Kalyanraman, J. Narayan   +4 more
openaire   +1 more source

Comparative studies of ZnO thin films grown by electron beam evaporation, pulsed laser and RF sputtering technique for optoelectronics applications

Applied Physics A, 2020
Rashmi Ranjan Kumar, Muddam Raja Sekhar, Raghvendra, R. Laha, S. Pandey   +4 more
semanticscholar   +1 more source

Gas-Dynamic Effects in Laser Pulse Sputtering of Aluminium

Materials Science Forum, 1994
Peterlongo, Andrea, Miotello, Antonio, R. Kelly   +2 more
openaire   +2 more sources

Innovative Infrared-pulsed laser assisted RF sputtered β-Ga2O3 thin film at low temperature process

, 2021
Y. Oh, J. Ji, S. Kim, J. Koh
semanticscholar   +1 more source

Multithreshold HF/DF Pulsed Laser Damage Measurements on Evaporated and Sputtered Silicon Films

1981
Previously, we reported a comparison of damage resistance of various coating materials deposited by vacuum evaporation and measured at 2.7 and 3.8 μm. It was found that Si films fail by a thermal process and, in agreement with other studies, that high-index materials, such as Si, tend to have lower thresholds than low-index dielectric materials, such ...
TM Donovan, JO Porteus, SC Seitel, P Kraatz   +3 more
openaire   +1 more source

Thin film properties of germanium oxide synthesized by pulsed laser sputtering in vacuum and oxygen environments

, 1993
P. J. Wolf, T. Christensen, Nathan G. Coit, Richard W. Swinford   +3 more
semanticscholar   +1 more source

Pulsed-laser sputtering of atoms and molecules. Part I: Basic solutions for gas-dynamic effects

, 1993
R. Kelly, A. Miotello
semanticscholar   +1 more source