Etch rate optimization in reactive ion etching of epoxy photoresists
Maarten Driesen +2 more
openalex +1 more source
Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching [PDF]
Tumura Masashi, Shinzo Yoshikado
openalex +1 more source
Spectrally Tunable 2D Material‐Based Infrared Photodetectors for Intelligent Optoelectronics
Intelligent optoelectronics through spectral engineering of 2D material‐based infrared photodetectors. Abstract The evolution of intelligent optoelectronic systems is driven by artificial intelligence (AI). However, their practical realization hinges on the ability to dynamically capture and process optical signals across a broad infrared (IR) spectrum.
Junheon Ha +18 more
wiley +1 more source
A Tracer Diffusion Study of Diverse Photo‐Ionic Phenomena in Strontium Titanate
Two strong interfacial photo‐ionic effects are demonstrated for the model system SrTiO3 through the application of isotope exchange experiments: UV illumination is found to enhance the oxygen surface exchange coefficient by several orders of magnitude and to depress the surface space‐charge potential substantially.
David M. Schwenkel +3 more
wiley +1 more source
On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO2 and SixNy) in Multi-Component Fluorocarbon Gas Mixtures. [PDF]
Efremov A, Lee BJ, Kwon KH.
europepmc +1 more source
Enhanced planarization technology by reactive ion beam etching and using a nanoimprint resist [PDF]
Lukas P. Lingenfelder +4 more
openalex +1 more source
The article reviews laser‐processed carbons from various precursors, processing mechanism and their application in advanced batteries. The laser process is chemical free, fast, and scalable, enabling improved battery performance and stability for Li, Na, and Zn battery technologies.
Sujit Deshmukh +2 more
wiley +1 more source
Tilted Micro Air Jet for Flow Control
In this paper, we present an interesting method to microfabricate a tilted micro air jet generator. We used the well-know deep reactive ion etching (DRIE) technique in order to realize in a silicon substrate a double side etching.
Malapert, Julien +3 more
core +1 more source
Mesoporous Carbon Thin Films with Large Mesopores as Model Material for Electrochemical Applications
Mesoporous carbon thin films possessing 70 nm mesopores are prepared on titanium substrates by soft templating of resol resins with a self‐synthesized poly(ethylene oxide)‐block‐poly(hexyl acrylate) block copolymer. A strategy to avoid corrosion of the metal substrate is presented, and the films are extensively characterized in terms of morphology ...
Lysander Q. Wagner +9 more
wiley +1 more source

