Plasma‐sequence‐engineered ALD (PSE‐ALD), based on sequential NH3 and N2 plasma pulses, enables ultrathin, dense SiNx films. ToF‐MS analysis confirms ligand removal via HCl evolution, while increased film density indicates network densification. The resulting SiNx coating provides robust protection of graphite under H2 plasma exposure.
Hye‐Young Kim +7 more
wiley +1 more source
Modeling of Methanol Steam Reforming in a Monolith Reactor: Effects of Internal Diffusion, Substrate Parameters, and Operating Conditions. [PDF]
Li Y, Fang M, Zhang Q, Wang X, Lei X.
europepmc +1 more source
A nanostructured, naturally flame‐retardant, and non‐toxic inorganic composite is introduced, which is laterally associated with silica nanoparticles to induce the restacking of the LDH lamella structure, thereby serving as an efficient thermal insulator.
Gayani Pathiraja +7 more
wiley +1 more source
Enhanced Anaerobic Digestion of Sewage Sludge Through the Integration of Thermal Hydrolysis and Bioelectrochemical Anaerobic Digestion. [PDF]
Wang CW +5 more
europepmc +1 more source
Light‐Programmable Interfaces: From Molecular Photoswitching to Adaptive Membrane Separations
This review advances an interface‐centered framework for light‐responsive membranes, linking molecular photoswitches (azobenzene (AZO), spiropyran (SP), diarylethene (DAE), donor–acceptor Stenhouse adducts (DASA), photoacid) to integration strategies in polymeric, porous, self‐assembled, and mixed‐matrix systems.
Liangliang Zhang +6 more
wiley +1 more source
Flow Chemistry as an Enabling Technology for Process-Intensified Amination Reactions: A Decadal Review. [PDF]
Zhou F +6 more
europepmc +1 more source
The gas‐phase decomposition of Al(acac)3 is investigated under inert, oxygen, and water‐containing conditions. Water is found to promote selective ligand removal and suppress hydrocarbon formation, while oxygen induces faster, less selective decomposition pathways.
Ilyas Adaköy +8 more
wiley +1 more source
Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High‐k Rutile Capacitors
The first direct atomic layer deposition (ALD) process of molybdenum dioxide (MoO2) thin films is reported using molybdenum(II) acetate dimer (Mo2(OAc)4) and oxygen (O2) as precursors at 235°C–275°C. The films are crystalline, exceptionally pure, and conductive.
Alexey Ganzhinov +8 more
wiley +1 more source
Removal of Bisphenol A, Bisphenol S, and Estrogenic Activity from Real Wastewater Using a Multi-stage IFAS System. [PDF]
do Amaral AF +5 more
europepmc +1 more source
Advances in Solid‐Phase Processing Techniques: Innovations, Applications, and Future Perspectives
Based on practical manufacturing challenges, this review examines advanced solid‐phase processing techniques that overcome the inherent limitations of conventional melting‐based and traditional solid‐phase manufacturing, enabling the production of higher‐performance components at reduced cost through process innovation and improved supply‐chain ...
Tianhao Wang
wiley +1 more source

