Results 141 to 150 of about 5,941,522 (258)

Inverse Design of Nanoparticulate Materials

open access: yesAdvanced Materials, EarlyView.
Inverse design shifts nanomaterial development from empirical trial‐and‐error to predictive model‐driven strategies. It can rely on knowledge‐based, data‐based, or hybrid process and property functions. This perspective article provides a practical framework for applying inverse design based on instructive examples. It discusses which modeling approach
Nabi Etienne Traoré   +5 more
wiley   +1 more source

Soft and Transient Bioelectronics Enabled by Polymer‐Free Ti3C2Tx MXene Hydrogels

open access: yesAdvanced Materials, EarlyView.
We present Ti3C2Tx MXene hydrogel (MXgel) bioelectronics, a soft, flexible, and fully transient platform for high‐fidelity neural recording and stimulation. MXgel bioelectronics exhibit exceptional electrical conductivities, low electrochemical impedances, and high charge injection capacities.
Raghav Garg   +15 more
wiley   +1 more source

Tamper‐Responsive Physical Unclonable Functions via Graphene‐Interlayered Block Copolymer Random Structures

open access: yesAdvanced Materials, EarlyView.
Self‐invalidating multilayer physical unclonable functions (PUFs) integrate fingerprint‐like metal nanopattern bilayers from block copolymer templates with highly reactive reduced graphene oxide (rGO) interlayers. This tamper‐responsive architecture blocks all unauthorized physical and chemical replication attempts while autonomously deactivating ...
Gyu Hui Jo   +7 more
wiley   +1 more source

Low Resistance Interphase Formation at the PEO‐LiTFSI|LGPS Interface in Lithium Solid‐State Batteries

open access: yesAdvanced Materials Interfaces, EarlyView.
Interfacial charge transfer and low‐resistance interphase formation between PEO‐based polymer and Li10GeP2S12 solid electrolytes are investigated using multi‐electrode impedance spectroscopy and advanced analytical techniques such as XPS and ToF‐SIMS.
Ujjawal Sigar   +6 more
wiley   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

open access: yesAdvanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source

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