Results 211 to 220 of about 5,746,058 (301)

Inductively Expandable Supraparticles as Microscopic Force Generators for Remote Mechanical Actuation

open access: yesAdvanced Materials, EarlyView.
This study demonstrates the combination of magnetic nanoparticles and functional blowing agents into supraparticles. Upon induction heating, they actuate via rapid gas generation or extensive volume expansion. These supraparticles lift up to 25 000 times their own mass and rapidly open cured epoxy resins, providing a versatile strategy for fast micron ...
Leoni Luthardt   +3 more
wiley   +1 more source

Dual‐State Programmable Oxide Transistor for Time‐Based Cryptography

open access: yesAdvanced Materials, EarlyView.
A DUPOT enables independently tunable Vth and Isat depending on gate bias polarity, producing three‐dimensional dynamical behavior within a transfer characteristic. This behavior originates from charge trapping and oxygen‐ion migration in the HfO2 layer.
Huisu Noh   +9 more
wiley   +1 more source

In Situ Lithium Nitridosilicate Interlayer via Reactive Anolyte Design for All‐Solid‐State Silicon Anodes

open access: yesAdvanced Materials, EarlyView.
Interfacial reactions in all‐solid‐state batteries are conventionally suppressed; here, they are designed. Vacancy‐rich β‐Li3N, acting as an anolyte, reacts controllably with silicon during composite anode fabrication, building a purpose‐made lithium nitridosilicate interlayer on every particle surface.
Tongtai Ji   +9 more
wiley   +1 more source

Controlled Synthesis of Tri‐ and Multi‐Doped Graphene

open access: yesAdvanced Materials Interfaces, EarlyView.
This review systematically evaluates synthesis routes for tri‐ and multi‐doped graphene, from hydrothermal and pyrolysis methods to flash Joule heating, critically assessing how each governs dopant incorporation, bonding configuration, and resulting electronic properties.
Maria Hasan   +4 more
wiley   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

open access: yesAdvanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source

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