Results 91 to 100 of about 196 (116)

Sputtering of Metal Oxides with an rf-Ion Source

Optical Interference Coatings, 1988
Ion beam of relatively low energy and large area have become a valueable tool in thin film production. The energies for the most important processes are several ten to several hundered eV for etching and ion assisted evaporation and several thousand eV for sputtering.
Ingo Kessler, Juergen Mueller, Gerhard Steiniger   +2 more
openaire   +1 more source

RF H⁻ Ion Source with Saddle Antenna

2010
In this project we are developing an RF H⁻ surface plasma source which will synthesize the most important developments in the field of negative ion sources to provide high pulsed and average current, high brightness, good lifetime, high reliability, and higher power efficiency.
Dudnikov, Vadim, Dudnikova, Galina, Johnson, Rolland, Stockli, Martin, Welton, Robert   +4 more
openaire   +1 more source

Development and applications of the RF-driven ion source

The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts., 2003
Summary form only given, as follows. RF driven ion sources have been developed at the Lawrence Berkeley National Laboratory for more than a decade. This type of ion source can be operated with 2 or 13.5 MHz in either cw or pulsed mode for positive or negative ion beam production.
openaire   +1 more source

The plasma impedance of RF-ion sources

13th International Electric Propulsion Conference, 1978
B. LENZ, R. WALTHER, H. LOEB
openaire   +1 more source

Production of Metallic and Other Ions in rf Ion Source

Review of Scientific Instruments, 1966
R. S. Hall, D. H. Poole, M. S. Stagg
openaire   +1 more source

Plasma density measurement of RF ion source

2015
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Voznyy, V.I., Miroshnichenko, V.I., Mordyk, S.M., Nagornyy, A.G., Nagornyy, D.A., Storizhko, V.E., Shulha, D.P.   +6 more
openaire   +1 more source

A new off-line ion source facility at IGISOL

Nuclear Instruments & Methods in Physics Research B, 2020
Markus Vilen, Ari Jokinen, Sarina Geldhof   +2 more
exaly  

New high current low energy ion source

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1987
Aoyagi Y, Namba S
exaly  

Negative cesium sputter ion source for generating cluster primary ion beams for secondary ion mass spectrometry analysis

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2001
Joe Bennett, Bennett Joe
exaly  

Inclusion of a MALDI ion source in the ion chromatography technique: conformational information on polymer and biomolecular ions

International Journal of Mass Spectrometry and Ion Processes, 1995
Gert von Helden, Michael Bowers, Thomas Wyttenbach   +2 more
exaly