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Silica Gel Processing
2012 Yimei Zhu, Hiromi Inada, Achim Hartschuh, Li Shi, Ada Della Pia, Giovanni Costantini, Amadeo L. Vázquez de Parga, Rodolfo Miranda, Antoine Barbier, Cristian Mocuta, Rachid Belkhou, Bharat Bhushan, J. H. Hoo, K. S. Park, R. Baskaran, K. F. Böhringer, Wei Lu, Michael Nosonovsky, Moon-Ho Ham, Ardemis A. Boghossian, Jong Hyun Choi, Michael S. Strano, Amy Lang, Maria Laura Habegger, Philip Motta, Bharat Bhushan, Thomas Bachmann, Hermann Wagner, Donald W. Brenner, Jian Chen, Nika Shakiba, Qingyuan Tan, Yu Sun, Julia R. Greer, M. Laver, S. M. Khaled, Alessandro Parodi, Ennio Tasciotti, Bakul C. Dave, Sarah B. Lockwood, Claudia Musicanti, Paolo Gasco, Fritz Vollrath, Alexander Booth, Andy C. McIntosh, Novid Beheshti, Richard Walker, Lars Uno Larsson, Andrew Copestake, Hyundoo Hwang, Yoon-Kyoung Cho, Jian Chen, Michael Chu, Claudia R. Gordijo, Xiao Yu Wu, Yu Sun, Mathias Kolle, Ullrich Steiner, Szu-Wen Wang, Frederik Ceyssens, Robert Puers, Xiaodong Han, Shengcheng Mao, Ze Zhang, Lei Jiang, Ling Lin, Regina Ragan, Vanni Lughi, Carlos Drummond, Marina Ruths, Weiqiang Mu, John B. Ketterson, Pierre Berini, Ya-Pu Zhao, Feng-Chao Wang, Shaurya Prakash, Simon J. Henley, José V. Anguita, S. Ravi P. Silva, Munish Chanana, Cintia Mateo, Verónica Salgueirino, Miguel A. Correa-Duarte, Swastik Kar, Saikat Talapatra, Javier Calvo Fuentes, José Rivas, M. Arturo López-Quintela, Soichiro Tsuda +88 moreopenaire +1 more source
