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2010
Silicon dioxide is the most commonly used insulator material in IC technology and in the other fields of silicon device fabrication technology. This chapter explains the various aspects of the growth and deposition of silicon dioxides. It also shows with example the utilization of different kinds of silicon dioxides for various purposes in the ...
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Silicon dioxide is the most commonly used insulator material in IC technology and in the other fields of silicon device fabrication technology. This chapter explains the various aspects of the growth and deposition of silicon dioxides. It also shows with example the utilization of different kinds of silicon dioxides for various purposes in the ...
openaire +3 more sources
Graphene and two-dimensional materials for silicon technology
Nature, 2019D. Akinwande +7 more
semanticscholar +1 more source
Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers
, 1990L. Canham
semanticscholar +1 more source
Determination of the thickness and optical constants of amorphous silicon
, 1983R. Swanepoel
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Über Silicone IV: Silicone‐Öle, Silicone‐Harze, Silicone‐Kautschuk
Fette, Seifen, Anstrichmittel, 1959openaire +1 more source
Silicene: compelling experimental evidence for graphenelike two-dimensional silicon.
Physical Review Letters, 2012P. Vogt +8 more
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