Results 171 to 180 of about 1,055,412 (359)

Omni‐Directional Assembly of 2D Single‐Crystalline Metal Nanosheets

Advanced Materials, EarlyView.
A versatile assembly method is developed to uniformly assemble 2D single‐crystal copper nanosheets (Cu NS) onto substrates with complex shapes via ultrasonication process. This technique leverages cavitation effects to deposit monolayer Cu NS films with minimal overlap.
Seungyeon Kim, Ho Kwang Choi, Young‐Seok Song, Min‐Young Seo, Hyunjung Lee, Sukang Bae, Byung Joon Moon, Seoung‐Ki Lee, Sang Hyun Lee, Tae‐Wook Kim   +9 more
wiley   +1 more source

Silicon Photonics

, 2014
Universidad de Málaga.
openaire   +1 more source

Decoding Directional Control in Metal‐Assisted Chemical Etching via Catalyst Architecture

Advanced Materials, EarlyView.
Metal‐assisted chemical etching (MaCE) enables silicon nanostructure fabrication but suffers from isotropic undercutting. This study highlights the critical role of catalyst morphology in etching directionality. High‐aspect‐ratio catalysts induce lateral etching, while thermal treatment at 450 °C stabilizes catalyst geometry, promoting vertical etching.
Yejin Han, Jihwan Jeong, Hyein Cho, Yebin Ahn, Soohyeok Park, HyeonSeok Kim, Jae Yeong Shin, Min‐Joon Park, Taehyo Kim, Han‐Don Um   +9 more
wiley   +1 more source

Basic photonic wire components in silicon-on-insulator [PDF]

, 2005
Pieter Dumon, Günther Roelkens, Wim Bogaerts, Dries Van Thourhout, Johan Wouters, S. Beckx, Patrick Jaenen, Roel Baets   +7 more
openalex   +1 more source

Synthesis and Photothermal Processing of Silicon‐Based Nanoconfined MXenes

Advanced Materials Interfaces, EarlyView.
Intercalation of titanium carbide (Ti3C2Tx) MXenes with aminopropyl terminated polydimethylsiloxane (amino‐PDMS) is demonstrated through ion‐exchange method followed by photonic curing (PC) using xenon flashlamp. The intercalation and PC result in enhanced interlayer spacing of Ti3C2Tx of 13.5 and 11 nm, respectively. Furthermore, conversion of PDMS to
Najma Khatoon, Binod Subedi, Ahmad Majed, Shiping Wang, Jibao He, Julie N.L. Albert, Michael Naguib, Douglas B Chrisey   +7 more
wiley   +1 more source

Strong enhancement of spontaneous emission in amorphous-silicon-nitride photonic crystal based coupled-microcavity structures

, 2001
Mehmet Bayındır, Selim Tanriseven, Atilla Aydınlı, Ekmel Özbay   +3 more
openalex   +2 more sources

80 - micron interaction length silicon photonic crystal waveguide modulator [PDF]

, 2005
Yongqiang Jiang, Wei Jiang, Lanlan Gu, Xiaonan Chen, Ray T. Chen   +4 more
openalex   +1 more source

Fabrication of Ultra‐Thick Masks for X‐Ray Phase Contrast Imaging at Higher Energy

Advanced Materials Interfaces, EarlyView.
This work shows a fabrication route to 500 µm thick X‐ray masks the thickest ever reported in the literature combining dynamic optimization of etching parameters and superconformal bismuth‐mediated gold filling. Their use in an Edge Illunomination set‐up showed their higher phase sensitivity at higher energies compared to thinner masks, especially for ...
Alessandro Rossi, Ian Buchanan, Alberto Astolfo, Martyna Michalska, Daniel Briglin, Anton Charman, Daniel Josell, Alessandro Olivo, Ioannis Papakonstantinou   +8 more
wiley   +1 more source

Optofluidic memory and self-induced nonlinear optical phase change for reservoir computing in silicon photonics. [PDF]

Nat Commun, 2023
Gao C, Gaur P, Almutairi D, Rubin S, Fainman Y.   +4 more
europepmc   +1 more source

Demonstration of 4H silicon carbide on aluminum nitride integrated photonics platform [PDF]

arXiv
The existing silicon-carbide-on-insulator photonic platform utilizes a thin layer of silicon dioxide under silicon carbide to provide optical confinement and mode isolation. Here, we replace the underneath silicon dioxide layer with a 1-$\mu$m-thick aluminum nitride and demonstrate a 4H-silicon-carbide-on-aluminum-nitride integrated photonics platform ...
arxiv